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Preparation of Metal Nanosuspensions by High-Pressure DC-Sputtering on Running Liquids

Published online by Cambridge University Press:  10 February 2011

M. Wagener ,
B. S. Murty  and
B. Günther
M. Wagener
Affiliation:
Fraunhofer-Institut für angewandte Materialforschung, Lesumer Heerstr. 36, D-28717 Bremen, Germany
B. S. Murty
Affiliation:
on leave from Indian Institute of Technology, Kharagpur-721 302, India
B. Günther
Affiliation:
Fraunhofer-Institut für angewandte Materialforschung, Lesumer Heerstr. 36, D-28717 Bremen, Germany
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Abstract

A modified VERL-process (Vacuum evaporation on running liquids) employing high pressure magnetron sputtering has been used for the preparation of suspensions with metal nanoparticles. The method has been tested for Ag- and Fe-suspensions by varying the pressure of the Argon sputtering atmosphere in the range of 1 to 30 Pa. A narrow particle size distribution with a mean particle size ranging from 5–18 nm has been found. The mean particle size increases with increasing Argon pressure in the pressure range under investigation. A descriptive model for the process of particle formation as a function of sputtering gas pressure is given.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 457: Symposium V – Nanophase and Nanocomposite Materials II , 1996 , 149
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

1. Yatsua, S., Tsukasaki, Y., Mihama, K., Uyeda, R., J. Cryst. Growth, 45, pp 490–494 (1978)Google Scholar
2. Hahn, H., Averback, R.S., J. Appl. Phys., 67, pp 1113–1115 (1990)Google Scholar
3. Edelstein, A.S., Kaatz, F., Chow, G.M., Peritt, J.M., in Studies of Magnetic Properties of Fine Particles edited by Dormann, J.L., Fiorani, D. (Elsevier Science Publishers, New York, 1992, pp 47–54 Google Scholar
4. Terauchi, S., Koshizaki, N., Umehara, H., NanoStruct. Mater., 5, pp 71–78 (1995)Google Scholar
5. Chow, G.M., Mater. Res. Soc. Proc., 206, pp 315–320 (1991)Google Scholar
6. Granquist, C.G., Buhrmann, R.A., J. Appl. Phys., 47, pp 2200- (1976)Google Scholar
7. Choi, S. J., Kushner, M. J., Mater. Res. Soc. Proc., 206, 283 (1991)Google Scholar
8. Kaatz, F.H., Chow, G.M., Edelstein, A.S., J. Mater. Res., 8, 995 (1993)Google Scholar
9. Zhaojing, D., Qiao, W., Jian, L., Qiang, S., J. Coll. Interf. Sci., 165, 346 (1994)Google Scholar