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The Preparation of Large Scale Monolayers of Gold Nanoparticles on Modified Silicon Substrates using a Controlled Pulling Method

Published online by Cambridge University Press:  10 February 2011

Richard Tilley ,
Satoshi Saito  and
Isao Mastui
Richard Tilley
Affiliation:
Advanced Materials & Devices Laboratory, Toshiba Corporate Research and Development Center, 1, Komukai Toshiba-Cho, Saiwai-ku, Kawasaki 212-8582, Japan.
Satoshi Saito
Affiliation:
Advanced Materials & Devices Laboratory, Toshiba Corporate Research and Development Center, 1, Komukai Toshiba-Cho, Saiwai-ku, Kawasaki 212-8582, Japan.
Isao Mastui
Affiliation:
Advanced Materials & Devices Laboratory, Toshiba Corporate Research and Development Center, 1, Komukai Toshiba-Cho, Saiwai-ku, Kawasaki 212-8582, Japan.
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Abstract

The preparation of large scale monolayers of dodecanethiol coated nanoparticles on modified silicon substrates for use in storage media is reported. The formation of nanoparticle monolayers was accomplished by vertically pulling various modified silicon substrates at controlled speeds from nanoparticle solutions. The silicon substrates investigated had silanol and hydrogen terminated surfaces, surfaces chemically modified by (CH3) 3SiNHSi(CH3) 3 and (CH3O) 3Si(CH2)2(CF2) 7CF3 and a silicon substrate coated with amorphous carbon. All of these substrates have different surface polarities and a wide variation in monolayer coverage was obtained. The effect of the substrate pulling speed and solvent were also investigated.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 775: Symposium P – Self-Assembled Nanostructured Materials , 2003 , P9.45
Copyright
Copyright © Materials Research Society 2003

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