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Preparation of Cross Sectional and Plan View TEM Samples of Thin Films on Mgo Substrates with an Additional Chemical Thinning Step

Published online by Cambridge University Press:  16 February 2011

Shang. H. Rou ,
Philip. D. Hren  and
Angus. I. Kingon
Shang. H. Rou
Affiliation:
Department of Materials Science and Engineering, N. C. State University, Raleigh, NC.
Philip. D. Hren
Affiliation:
Department of Materials Science and Engineering, N. C. State University, Raleigh, NC.
Angus. I. Kingon
Affiliation:
Department of Materials Science and Engineering, N. C. State University, Raleigh, NC.
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Abstract

Single crystal MgO is a common substrate for the deposition of oxide thin films. The conventional cross sectional transmission electron microscopy sample preparation procedure suffers the drawbacks of: 1)- extensive ion milling time; 2) a higher milling rate for the thin films than for the substrate; 3) introduction of artifacts and contamination during ion milling; and 4) generation of excess defects into the substrate during mechanical thinning. An additional chemical thinning step using hot orthophosphoric acid can reduce or eliminate these adverse effects.

This technique can be applied generally to thin film samples deposited on substrates with a low ion milling rate. Furthermore, substrates which are sensitive to mechanical stress and ion beam damage are also suitable for this technique, provided an appropriate chemical polishing solution and compatible epoxy can be found. The unique features of this technique are briefly presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 199: Symposium W – Specimen Preparation for Transmission Electron Microscopy of Materials II , 1990 , 225
Copyright
Copyright © Materials Research Society 1990

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References

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