Hostname: page-component-78c5997874-8bhkd Total loading time: 0 Render date: 2024-11-08T05:08:12.603Z Has data issue: false hasContentIssue false

Polar-Twinned Defects in LiGaO2 Substrates Lattice Matched with GaN

Published online by Cambridge University Press:  10 February 2011

Takao Ishii
Affiliation:
NTT System Electronics Laboratories, 3–1 Morinosato Wakamiya, Atsugi-shi, Kanagawa, 243–01, Japan
Yasuo Tazoh
Affiliation:
NTT System Electronics Laboratories, 3–1 Morinosato Wakamiya, Atsugi-shi, Kanagawa, 243–01, Japan
Shintaro Miyazawa
Affiliation:
NTT System Electronics Laboratories, 3–1 Morinosato Wakamiya, Atsugi-shi, Kanagawa, 243–01, Japan
Get access

Abstract

We investigated the Czochralski growth of LiGaO2 single crystal for use as a substrates for the epitaxial growth of hexagonal GaN. Crossed lines were observed in mechano-chemically polished {001} wafers sliced from a (001) axis boule. Chemical etching revealed that there exists a difference in chemical stability between two domains separated by a crossed line. Since LiGaO2 single crystal is polar along the c-axis, the formation of multi-domain structure is due to the polarity inversion of the c-axis, that is, polar twinned defects. We found that the GaN thin film on the (001) substrate with a multi-domain structure peeled off and that this is closely related with multi-polarity of substrate.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Amano, H., Sawaki, N., Akazaki, I. and Toyoda, Y.: Appl. Phys Lett 48 353 (1986)Google Scholar
[2] Marezio, M.: Acta Cryst. 18 481 (1965)Google Scholar
[3] Nicholls, J. H. M., Gallagher, H., Henderson, B., Trager-Cowan, C., Middleton, P. G., O'Donnell, K. P., Cheng, T. S., Foxon, C. T. and Chai, B. H. T.: Mat. Res. Soc. Symp. Proc. 395 535 (1996)Google Scholar
[4] Remeika, J. P. and Ballman, A. A.: Appl. Phys. Lett 5 180 (1964)Google Scholar
[5] Kung, P., Saxler, A., Zhang, X., Walker, D., Lavado, R. and Razeghi, M.: Appl. Phys. Lett. 69 2116 (1996)Google Scholar
[6] Ishii, T., Tazoh, Y. and Miyazawa, S.: Jpn. J. Appl. Phys. 36 L139 (1997)Google Scholar
[7] The polishing powder was “Baikalox”(Baikowski international corporation).Google Scholar