Hostname: page-component-78c5997874-xbtfd Total loading time: 0 Render date: 2024-11-02T19:59:16.748Z Has data issue: false hasContentIssue false

Photoemission Study of Metal-Deposited p-Sexiphenyl Film

Published online by Cambridge University Press:  21 March 2011

E. Ito
Affiliation:
Venture Business Laboratory, Nagoya University, Chikusa-ku, Nagoya, 464-8603, Japan, e-mail: [email protected]
N. Koch
Affiliation:
Institut für Festkörperphysik, Technische Universität Graz, A-8010, Graz, Austria
H. Oji
Affiliation:
Research Center for Materials Science, Nagoya University, Chikusa-ku, Nagoya, 464-8602, Japan
H. Ishii
Affiliation:
Department of Chemistry, Graduate School of Science, Nagoya University, Chikusa-ku, Nagoya, 464-8602, Japan
G. Leising
Affiliation:
Institut für Festkörperphysik, Technische Universität Graz, A-8010, Graz, Austria
K. Seki
Affiliation:
Research Center for Materials Science, Nagoya University, Chikusa-ku, Nagoya, 464-8602, Japan Department of Chemistry, Graduate School of Science, Nagoya University, Chikusa-ku, Nagoya, 464-8602, Japan
Get access

Abstract

Metal deposition on a p-sexiphenyl (6P) film was studied by ultraviolet photoelectron spectroscopy (UPS), metastable atom electron spectroscopy (MAES), and X-ray photoelectron spectroscopy (XPS). The deposited metals were Au, Mg, and several alkali metals (K, Na, Rb, and Cs). No chemical reaction between 6P and Au or Mg was observed in the measured spectra, while additional gap states appeared in the UPS and MAES spectra by deposition of the alkali metals. The diffusion of Au and Mg atoms into the 6P film was observed in the MAES spectra. We found the trend of the vacuum level shift is different between the systems of the 6P on the Au and its reversed systems (Au on the 6P film), suggesting the different formation of the interface depending on the deposition sequence.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Ishii, H., Sugiyama, K., Yoshimura, D., Ito, E., Ouchi, Y., and Seki, K., IEEE J. Selected Topics in Quantum Electronics 4, 24 (1998) and References therein.Google Scholar
2. Ishii, H., Sugiyama, K., Ito, E., and Seki, K., Adv. Mat. 11, 625 (1999).Google Scholar
3. Rajagopal, R. and Kahn, A., Appl. Phys. Lett. 84, 355 (1998).Google Scholar
4. Hill, I. G., Rajagopal, R., and Kahn, A., J. Appl. Phys., 84, 3236 (1998).Google Scholar
5. Choong, V.-E., Mason, M. G., Tang, C. W., and Gao, Y., Appl. Phys. Lett. 72, 2689 (1998).Google Scholar
6. Koch, N., Yu, L.-M., Parente, V., Lazzaroni, R., Johnson, R. L., Leising, G., Pireaux, J.J., and Bredas, J. L., Adv. Mater. 10, 1038 (1998).Google Scholar
7. Harada, Y. and Ozaki, H., Chem. Rev. 97, 1897 (1997).Google Scholar
8. Gustafsson, G., Treacy, C. M., Gao, Y., Klavetter, F., Colamri, N., and Heeger, A. J., Syn. Metals, 55–57, 4123 (1993).Google Scholar
9. Era, M., Tsutsui, T., and Sato, S., Appl. Phys. Lett., 67, 2436 (1990).Google Scholar
10. Fichou, D., Horowitz, G., Xu, B., and Garnier, F., Syn. Metals, 39, 243 (1990).Google Scholar
11. Oji, H., Ito, E., Furuta, M., Kajikawa, K., Ishii, H., Ouchi, Y., and Seki, K., J. Electron Spectrosc. Relat. Phenom., 101–103, 517 (1999).Google Scholar
12. Ito, E., Ph. D. thesis, Nagoya Univ. (1997).Google Scholar