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Photochemical Modification of Fluorocarbon Resin Surface to Adhere with Epoxy Resin

Published online by Cambridge University Press:  22 February 2011

M. Okoshi ,
T. Miyokawa ,
H. Kashiura  and
M. Murahara
M. Okoshi
Affiliation:
Graduate Student of Tokai University
T. Miyokawa
Affiliation:
Graduate Student of Tokai University
H. Kashiura
Affiliation:
Graduate Student of Tokai University
M. Murahara
Affiliation:
Department of Electrical Engineering, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa 259-12, JAPAN
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Abstract

An epoxy-compatible layer was produced in the near-surface region of a fluorocarbon resin by irradiating with an ArF excimer laser in a gaseous B(CH3)3 or a B(OH)3 water solution atmosphere. The pure photochemical reaction was employed in the modification process, the defluorination of the surface was performed with boron atoms which were photo-dissociated from B(CH3)3 or B(OH)3. The CH3 or OH radicals, also photo-dissociated, replaced the fluorine atoms of the surface. As a result, chemical bonding of the surface with the epoxy was performed. The adhesive strength was evaluated by the shearing tensile test, and the epoxy break value of 130 kgf/cm2 was sucessfully achieved.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 334: Symposium W – Gas-Phase and Surface Chemistry in Electronic Materials Processing , 1993 , 365
Copyright
Copyright © Materials Research Society 1994

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