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Photoactivated Metal-Oxide Gas Sensing Nanomesh by Using Nanosphere Lithography

Published online by Cambridge University Press:  11 September 2014

Yu-Hsuan Ho
Affiliation:
Graduate Institute of Electronics Engineering, National Taiwan University, Taipei, Taiwan Research Center for Applied Sciences, Academia Sinica, Taipei 115, Taiwan
Tsu-Hung Lin
Affiliation:
Institute of Applied Mechanics, National Taiwan University, Taipei, Taiwan
Yi-Wen Chen
Affiliation:
Institute of Applied Mechanics, National Taiwan University, Taipei, Taiwan
Wei-Cheng Tian
Affiliation:
Graduate Institute of Electronics Engineering, National Taiwan University, Taipei, Taiwan
Pei-Kuen Wei
Affiliation:
Research Center for Applied Sciences, Academia Sinica, Taipei 115, Taiwan
Horn-Jiunn Sheen*
Affiliation:
Institute of Applied Mechanics, National Taiwan University, Taipei, Taiwan
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Abstract

A photoactivated ZnO nanomesh with precisely controlled dimensions and geometries is fabricated by using nanosphere lithography process. The nanomesh structures effectively increase the surface-to-volume ratio to improve the sensing response under the same testing gas. And the periodical nanostructures also increase the effective light path and lead to more efficient light activation for gas sensing. With the increase of the photoinduced oxygen ions by UV illumination, a distinguished sensing response is observed at room temperature. In the optimized case, the sensing response (△R/R0) of the ZnO nanomesh at the butanol concentration of 500 ppm is 97.5%, which is 4.54 times higher than the unpatterned one.

Type
Articles
Copyright
Copyright © Materials Research Society 2014 

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References

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