Hostname: page-component-745bb68f8f-kw2vx Total loading time: 0 Render date: 2025-01-12T09:35:27.355Z Has data issue: false hasContentIssue false
  • English
  • Français

P-Glass Reflow with a Tunable CO2 Laser

Published online by Cambridge University Press:  15 February 2011

P. Jeuch ,
J.P. Joly  and
J.M. Hode
P. Jeuch
Affiliation:
LETI-CENG – 38041 – Grenoble Cedex France
J.P. Joly
Affiliation:
LETI-CENG – 38041 – Grenoble Cedex France
J.M. Hode
Affiliation:
LETI-CENG – 38041 – Grenoble Cedex France
Get access

Abstract

Phosphosilicate glass reflow to improve step coverage of metallizations in integrated circuits is usualy made by a high temperature heat treatment. A new technique is proposed to achieve this annealing by a transient localized heating with a tunable CW CO2 laser. A selective coupling of the laser power is obtained by choosing a 9.25 μm wavelength which matches the Si-O absorption band at 1100 cm−1. Focusing and scanning the laser beam makes the P-glass flow without excessive substrate heating.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 4: Symposium A – Laser and Electron-Beam Interactions with Solids , 1981 , 603
Copyright
Copyright © Materials Research Society 1982

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

(1) Weinberg, Z.A., Appl. Phys. Lett. 39, 421 (1981)Google Scholar
(2) Naumaan, A. and Boyd, J.T., J. Vac. Sci. Technol. 18, 821 (1981)Google Scholar
(3) Hammond, C.R., Phys. Chem. Glasses, 19, 41 (1978)Google Scholar
(4) Lax, M., J. Appl. Phys. 48, 3919 (1977)Google Scholar
(5) Lax, M., Appl. Phys. Lett. 33, 788 (1978)Google Scholar
(6) Bell, A.E., RCA Review, 40, 295 (1979)Google Scholar