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Partially Ionized Beam Deposition of Thin Films

Published online by Cambridge University Press:  21 February 2011

T.-M. Lu
T.-M. Lu*
Affiliation:
Center for Integrated Electronics and Physics Department Rensselaer Polytechnic Institute, Troy, NY 12180
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Abstract

It has been shown recently that using less than a few percent of self-ions, i.e., ions derived from the deposition material itself, (partially ionized beam (PIB) deposition), one can dramatically modify thin film properties. In this paper we discuss phenomena such as surface cleaning, enhanced surface ordering, and ion-induced surface damage associated with PIB-surface interactions. PIB metal deposition has been emphasized.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 147: Symposium C – Ion Beam Processing of Advanced Electronic Materials , 1989 , 207
Copyright
Copyright © Materials Research Society 1989

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References

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