Hostname: page-component-78c5997874-ndw9j Total loading time: 0 Render date: 2024-11-03T01:59:43.186Z Has data issue: false hasContentIssue false
  • English
  • Français

PACVD Fluorinated Silicon Nitride Films Deposited From SiF4/NH3 GAS MIXTURES

Published online by Cambridge University Press:  16 February 2011

A. Castro ,
M. Gasset ,
C. Gomez-Aleixandre ,
O. Sanchez  and
J. M. Albella
A. Castro
Affiliation:
Instituto de Clencia de Materiales, CSIC, Universidad Autonoma C-XII Cantoblanco 28049 Madrid, SPAIN
M. Gasset
Affiliation:
Instituto de Clencia de Materiales, CSIC, Universidad Autonoma C-XII Cantoblanco 28049 Madrid, SPAIN
C. Gomez-Aleixandre
Affiliation:
Instituto de Clencia de Materiales, CSIC, Universidad Autonoma C-XII Cantoblanco 28049 Madrid, SPAIN
O. Sanchez
Affiliation:
Instituto de Clencia de Materiales, CSIC, Universidad Autonoma C-XII Cantoblanco 28049 Madrid, SPAIN
J. M. Albella
Affiliation:
Instituto de Clencia de Materiales, CSIC, Universidad Autonoma C-XII Cantoblanco 28049 Madrid, SPAIN
Get access

Abstract

Fluorinated silicon nitride films deposited from SiF4/NH3 gas mixtures by PACVD at two different frequencies have been investigated. At 13.56 MHz, low deposition rate was detected and no appreciable changes were observed when the deposition parameters varied in a wide range. On the contrary, higher deposition rates were achieved when a 35 KHz frequency was applied. These low frequency silicon nitride films showed an increase in the fluorine content In their structure when the SiF4 flow ratio in the gas mixture was increased, as detected by analytical resolution of the IR spectra. In addition, analysis of the plasma emission spectra has been performed in order to explain the effect of the plasma frequency in the deposition process.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 223: Symposium E – Low Energy Ion Beam and Plasma Modification of Materials , 1991 , 321
Copyright
Copyright © Materials Research Society 1991

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. - Sánchez, O., Gómez-Aleixandre, C. and Palacio, C., J.Mater Sci. (1991) (in press )Google Scholar
2. - Gómez-Aleixandre, C., Sánchez, O. and Albella, J.M., J.Mater.Sci. (1991) (in press )Google Scholar
3. - Pearse, R.W.B. and Gaydon, A.G., ”The identification of Molecular Spectra”, 4th edition (Chapman and Hall, London, 1976)p.217–235 Google Scholar
4. - Bruno, G., Capezzuto, P., Cicala, G. and Cramarossa, F., J.Mater.Res. 4, 366(1989).Google Scholar