Article contents
Oxygen Precipitation and Thermal Donors in Silicon
Published online by Cambridge University Press: 28 February 2011
Abstract
Oxygen in silicon precipitates with second order kinetics at the normal diffusion rate at 450° C and there Is evidence for self-Interstitial generation. These findings are discussed In relation to thermal donors.
- Type
- Research Article
- Information
- Copyright
- Copyright © Materials Research Society 1986
References
REFERENCES
- 6
- Cited by