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Optical Properties of Hydrogenated Amorphous Carbon Films Grown From Methane Plasma

Published online by Cambridge University Press:  22 February 2011

J. J. Pouch ,
S. A. Alterovitz ,
J. D. Warner ,
D. C. Liu  and
W. A. Lanford
J. J. Pouch
Affiliation:
National Aeronautics and Space Administration, Lewis Research Center, Cleveland, Ohio 44135
S. A. Alterovitz
Affiliation:
National Aeronautics and Space Administration, Lewis Research Center, Cleveland, Ohio 44135
J. D. Warner
Affiliation:
National Aeronautics and Space Administration, Lewis Research Center, Cleveland, Ohio 44135
D. C. Liu
Affiliation:
National Aeronautics and Space Administration, Lewis Research Center, Cleveland, Ohio 44135
W. A. Lanford
Affiliation:
State University of New York at Albany, Albany, New York, 12222
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Abstract

We have used a 30 kHz ac glow discharge formed from methane gas to grow carbon films on InP substrates. Both the growth rate, and the relative Ar ion sputtering rate at 3 keV varied monotonically with deposition power. The Ar ion etchigg rate of the films decreased with deposition power. Results from the 15N nuclear reaction profile experiments indicated a slight drop in the hyorogen concentration as more energy was dissipated in the ac discharge. Values for the inoex of refraction and extinction coefficient ranged from 1.721 to 1.910 and 0 to -0.188, respectively. Optical bandgaps as high as 2.34 eV were determined.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 47: Symposium C – Thin Films: The Relationship of Structure to Properties , 1985 , 201
Copyright
Copyright © Materials Research Society 1985

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References

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