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Optical Behavior of Sputter-Deposited Aluminum Nitride: Relationship to Film Cheiistry
Published online by Cambridge University Press: 22 February 2011
Abstract
Films which are nominally aluminum nitride were grown by reactive sputter deposition using an aluminum target and rf-excited nitrogen discharges operated at power levels from 100 to 800W. Depositions were made on water-cooled (111)-cut Si and amorphous quartz substrates. The optical behavior of these films and its relationship to chemistry is discussed in the present paper.
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- Copyright © Materials Research Society 1985
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