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A Novel Gap Narrowing Process for Creating High Aspect Ratio Transduction Gaps for MEM HF Resonators

Published online by Cambridge University Press:  01 February 2011

Steve Stoffels ,
George Bryce ,
Rita Van Hoof ,
Bert Du Bois ,
Robert Mertens ,
Robert Puers ,
Harrie A.C. Tilmans  and
Ann Witvrouw
Steve Stoffels
Affiliation:
[email protected], IMEC, United States
George Bryce
Affiliation:
[email protected], IMEC, Leuven, Belgium
Rita Van Hoof
Affiliation:
[email protected], IMEC, Leuven, Belgium
Bert Du Bois
Affiliation:
[email protected], IMEC, Leuven, Belgium
Robert Mertens
Affiliation:
[email protected], IMEC, Leuven, Belgium
Robert Puers
Affiliation:
[email protected], KULeuven, ESAT, Leuven, Belgium
Harrie A.C. Tilmans
Affiliation:
[email protected], IMEC, Leuven, Belgium
Ann Witvrouw
Affiliation:
[email protected], IMEC, Leuven, Belgium
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Abstract

In this work a novel technique to create nanometer sized air gaps for high frequency (HF) mechanical resonators will be presented. The technique is based on the narrowing of initially wide gaps with a conformal “narrowing” layer. The novelty of this technique is that it enables the creation of narrow high-aspect ratio gaps (e.g. 100nm gaps in 10μm thick layers) without the need for complex lithography or high aspect ratio etching. Furthermore, the electrodes and the resonator itself can be patterned in a single processing step. The process methodology will be explained and validation experiments in a silicon-germanium (SiGe) based technology will be shown. This technology uses low temperature (∼450°C) poly silicon-germanium (SiGe) as the structural layer, which can be processed above CMOS, and therefore allows the fabrication of MEM devices above CMOS.

Keywords

microelectro-mechanical (MEMS)chemical vapor deposition (CVD) (chemical reaction)reactive ion etching
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1139: Symposium GG – Microelectromechanical Systems–Materials and Devices II , 2008 , 1139-GG01-05
Copyright
Copyright © Materials Research Society 2009

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References

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