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Novel Candidate of c-axis-oriented BLSF Thin Films for High-Capacitance Condenser

Published online by Cambridge University Press:  11 February 2011

Takashi Kojima ,
Yukio Sakashita ,
Takayuki Watanabe ,
Kazumi Kato  and
Hiroshi Funakubo
Takashi Kojima
Affiliation:
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226–8502, Japan
Yukio Sakashita
Affiliation:
TDK Corporation, 570–2, Matsugashita, Minamihatori, Narita-shi, Chiba 286–8588, Japan
Takayuki Watanabe
Affiliation:
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226–8502, Japan
Kazumi Kato
Affiliation:
National Institute of Advanced Industrial Science and Technology, 2266–98 Anagohara, Shimoshidami, Moriyama-ku, Nagoya 463–8560, Japan
Hiroshi Funakubo
Affiliation:
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226–8502, Japan
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Abstract

c-axis-oriented SrBi2Ta2O9 thin films with various thickness ranging from 20–170 nm were epitaxially grown on (100)SrRuO3 (SrRuO3 is give for the pseudo-cubic unit cell)//(100)SrTiO3 substrates by metalorganic chemical vapor deposition (MOCVD). The relative dielectric constants of these films kept a constant value of about 55 with decreasing film thickness down to 20 nm. The capacitances of these films were almost independent of the applied electric field; change of capacitance for these films on applied electric field from 0 kV/cm to 100 kV/cm was within 0.017 % and tano value was within 1.3 %. The leakage current densities were constant against the film thickness on the order of 10-8 A/cm2 at 150 kV/cm. Surface flatness of these films were also almost the same irrespective of the film thickness. These characteristics are very attractive for high-capacitance condenser application. Therefore, c-axis-oriented BLSF thin films are novel candidates for high-capacitance condenser application having both bias-free and thickness independent characteristics together with the good surface smoothness.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 748: Symposium U – Ferroelectric Thin Films XI , 2002 , U15.2
Copyright
Copyright © Materials Research Society 2003

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References

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