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New Materials and New Processes for MEMS Applications

Published online by Cambridge University Press:  10 February 2011

J.-Å. Schweitz ,
K. Larsson ,
G. Thornell ,
H. Björkman  and
F. Nikolajeff
J.-Å. Schweitz
Affiliation:
Centre for Advanced Microengineering (AME), The Ångström Laboratory, Uppsala University, Box 534, SE-751 21 Uppsala, Sweden
K. Larsson
Affiliation:
Centre for Advanced Microengineering (AME), The Ångström Laboratory, Uppsala University, Box 534, SE-751 21 Uppsala, Sweden
G. Thornell
Affiliation:
Centre for Advanced Microengineering (AME), The Ångström Laboratory, Uppsala University, Box 534, SE-751 21 Uppsala, Sweden
H. Björkman
Affiliation:
Centre for Advanced Microengineering (AME), The Ångström Laboratory, Uppsala University, Box 534, SE-751 21 Uppsala, Sweden
F. Nikolajeff
Affiliation:
Centre for Advanced Microengineering (AME), The Ångström Laboratory, Uppsala University, Box 534, SE-751 21 Uppsala, Sweden
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Abstract

The field of “non-silicon MEMS” is today rapidly expanding. The reasons are numerous: silicon has a limited functionality in many MEMS applications; the toolbox for micromaching of non-silicon materials is steadily growing in size and versatility; the price level of a variety of other advanced materials for MEMS has become more competitive etc. This development is here illustrated by a number of examples from a wide variety of materials classes, methods for synthesis and microprocessing, and fields of application. Among these examples are high-aspect ratio processing of different materials by ion track technology (MITE) and deep ion projection lithography (DIPL); laser microprocessing and free-space 3D laser writing; high-precision 3D diamond replicas from microstructured silicon masters; and microreplication in polymeric materials for microoptics and microsystems technology.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 605: Symposium MM – Materials Science of Microelectromechanical Systems Devices II , 1999 , 57
Copyright
Copyright © Materials Research Society 2000

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References

1.For a review see e.g: Bäuerle, D., Laser Processing and Chemistry, 2nd edition (Springer-Verlag, Berlin 1996)Google Scholar
2. Larsson, K., Williams, K., Maxwell, J. and Boman, M., Twelfe IEEE International Conference on Micro Electro Mechanical Systems (Cat. No.99CH36291), Piscataway, NJ, USA; 1999; xxxvi+660 pp. p.232–7.Google Scholar
3. Larsson, K., Williams, K., Maxwell, J. and Boman, M., J. de Phys. IV Vol.9 p.785 (1999)Google Scholar
4. Madden, J. D. and Hunter, I. W., J. Microelectromech. Systems, 5 (1), 24–32 (1996).Google Scholar
5. Jansson, A., Thornell, G., and Johansson, S., accepted by J. of The Electrochem. Soc., 1999.Google Scholar
6. Thornell, G., Jansson, A., and Johansson, S., Proc. SPIE, Brisbane, Australia, Oct. 27-29, 1999.Google Scholar
7. Spohr, R., Ion Tracks and Microtechnology: Principles and Applications, (Vieweg Verlag, Mainz, 1990).10.1007/978-3-322-83103-3Google Scholar
8. Hjort, K., Thornell, G., Spohr, R., and Schweitz, J.-Å., Proc. IEEE MEMS, San Diego, USA, Feb. 11-15, 1996, pp. 267–271.Google Scholar
9. Thornell, G., Hjort, K., Studer, B., and Schweitz, J.-Å., IEEE Transactions on Ultrrasonics, Ferroelectrics, and Frequency Control, vol. 44, no. 4, pp. 829–838 (1997).Google Scholar
10. Thornell, G., Spohr, R., Veldhuizen, E. J. van, and Hjort, K., Sensors and Actuators, A 73, pp. 176–183 (1999).Google Scholar
11. Björkman, H., Rangsten, P., Hollman, P., and Hjort, K., Sensors & Actuators, 73, 20–29 (1999)Google Scholar
12. Björkman, H., Rangsten, P., Simu, U., Karlsson, J., Hollman, P., and Hjort, K., MEMS'98, Heidelberg, Germany, 34–39, 1998.Google Scholar
13. Gåhlin, R., Björkman, H., Rangsten, P., and Jacobson, S., Accepted for publication in Wear.Google Scholar
14. Andersson, J., Hollman, P. and Jacobson, S., ABTEC'99, Brisbane, Australia, 22-24 Nov. 1999.Google Scholar
15. Björkman, H., Andersson, J., Hollman, P., Eriksen, P., Palmskog, G., and Hjort, K., Diamond'99, Prague, Czech Republic, 12-17 Sept. 1999.Google Scholar
16. Rangsten, P., Ribbing, C., Strandman, C., Hök, B., and Smith, L., Proc. Transducers'99, Sendai, Japan, 1999, pp. 208–211.Google Scholar
17. Björkman, H., Rangsten, P., and Hjort, K., Accepted for publication in Sensors & Actuators.Google Scholar
18. Rangsten, P., Björkman, H., and Hjort, K., Transducers'99, Sendai, Japan, pp. 190–193, 1999.Google Scholar
19. Nikolajeff, F., Löfving, B., Johansson, M., Bengtsson, J., Hård, S. and Heine, C., submitted for publication in Applied Optics.Google Scholar
20. Popovic, Z., Sprague, R. A. and Connell, G. A. Neville, Appl. Opt. 27, 1281–1284 (1988).Google Scholar