Published online by Cambridge University Press: 15 February 2011
Significant dissociation is normally detected under non-optimised transient annealing of GaAs. We have utilised neutron activation to measure As and Ga loss from virgin and implanted material annealed under various transient conditions. Complementary RBS data are reported. In particular, surface dissociation has been measured as a function of pulsed ruby laser power and for several combinations of time and surface temperature using an incoherent light source and a vitreous carbon strip heater.
The results indicate that neutron activation analysis offers a powerful tool to identify the conditions required to minimise GaAs dissociation during annealing. For examplq ruby laser pulses of energy 0.29–1.38 J cm−2 caused As loss of 4 – 90 × 10 cm−2.