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(Negative) Electron Affinity of AlN and AlGaN Alloys

Published online by Cambridge University Press:  21 February 2011

R.J. Nemanich
Affiliation:
Department of Physics and Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-8202
M.C. Benjamin
Affiliation:
Department of Physics and Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-8202
S.P. Bozeman
Affiliation:
Department of Physics and Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-8202
M.D. Bremser
Affiliation:
Department of Physics and Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-8202
S.W. King
Affiliation:
Department of Physics and Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-8202
B.L. Ward
Affiliation:
Department of Physics and Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-8202
R.F. Davis
Affiliation:
Department of Physics and Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-8202
B. Chen
Affiliation:
Department of Physics and Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-8202
Z. Zhang
Affiliation:
Department of Physics and Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-8202
J. Bernholc
Affiliation:
Department of Physics and Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-8202
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Abstract

The electron affinity of a semiconductor defines the relationship of the vacuum level and the semiconductor band structure. It is dependent on the atomic orbitals of the material and the surface termination. We report experimental and theoretical results that support the presence of a negative electron affinity on AlN and the Al rich AlGaN alloys. The GaN surface is found to exhibit a (positive) electron affinity of 3.3eV. The experimental measurements employ UV-photoemission spectroscopy on in situ gas-source MBE samples and on CVD samples. Theoretical results indicate that the (negative) electron affinity of AlN depends sensitively on the surface reconstruction and adatom termination. The experimental dependence of the electron affinity on alloy concentration is presented. The results indicate that AlGaN alloys with band gap similar or greater than that of diamond will exhibit a negative electron affinity. Field emission results are reported, and the characteristics are similar to those obtained from a diamond film. Issues related to cold cathode electronic devices based on NEA surfaces are noted.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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References

REFERENCES

1 Himpsel, F.J., Knapp, J.A., van Vechten, J.A., and Eastman, D.E., Phys. Rev. B20, 624 (1979).Google Scholar
2 Pate, B.B., Surf. Sci. 165, 83 (1986).Google Scholar
3 van der Weide, J., and Nemanich, R. J., Appl. Phys. Lett. 62, 1878 (1993).Google Scholar
4 Baumann, P.K. and Nemanich, R.J., Diamond, J. Rel. Mat. 4, 802 (1995).Google Scholar
5 Benjamin, M.C., Wang, C., Davis, R.F., Nemanich, R.J., Appl. Phys. Lett. 64, 3288 (1994).Google Scholar
6 Zangwill, A (1988), Physics at Surface, (Cambridge).Google Scholar
7 van der Weide, J., Zhang, Z., Baumann, P.K., Wensell, M.G., Bernholc, J. and Nemanich, R.J., Phys. Rev. B 50, 5803 (1994).Google Scholar
8 Zhang, Z., Wensell, M.C., and Bernholc, J., Phys. Rev. B51, 5291 (1995).Google Scholar
9 Bandis, C. and Pate, B.B., Phys. Rev. Lett. 74, 777(1995).Google Scholar
10 Pickett, W., Phys. Rev. Lett. 73, 1664 (1994).Google Scholar
11 Car, R. and Parrinello, M., Phys. Rev. Lett. 55, 2471 (1985).Google Scholar
12 Zhang, Z., Chen, B., and Bernholc, J., to be published.Google Scholar
13 Wang, C., Garcia, A., Ingram, D.C., Lake, M., and Kordesch, M.E., Electron. Lett. 27, 1459 (1991).Google Scholar
14 Xu, N.S., Latham, R.V. and Tzeng, Y., Electron. Lett. 29, 1596 (1993).Google Scholar
15 Huang, Z.-, Cutler, P.H., Miskovsky, N.M. and Sullivan, T.E., Appl. Phys. Lett. 65, 2562 (1994).Google Scholar
16 King, S.W., Benjamin, M.C., Nemanich, R.J., Davis, R.F., Lambrecht, W.R.L., (this volume).Google Scholar
17 Powers, M. J., Benjamin, M. C., Porter, L. M., Nemanich, R. J., Davis, R. F., Cuomo, J. J., Doll, G. L. and Harris., Stephen J. Appl. Phys. Lett., (in press).Google Scholar