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Nano-Structural Control of Molecular-Pore Stacked (MPS) SiOCH Films Using Plasma Copolymerization Reaction

Published online by Cambridge University Press:  01 February 2011

Hironori Yamamoto ,
Fuminori Ito ,
Munehiro Tada ,
Tsuneo Takeuchi ,
Naoya Furutake  and
Yoshihiro Hayashi
Hironori Yamamoto
Affiliation:
[email protected], NEC Corporation, System Devices Reseach Laboratories, 1120 Shimokuzawa, Sagamihara, Kanagawa, 229-1198, Japan
Fuminori Ito
Affiliation:
[email protected], NEC Corporation, 1120, Shimokuzawa, Sagamihara, Kanagawa, 229-1198, Japan
Munehiro Tada
Affiliation:
[email protected], NEC Corporation, 1120, Shimokuzawa, Sagamihara, Kanagawa, 229-1198, Japan
Tsuneo Takeuchi
Affiliation:
[email protected], NEC Corporation, 1120, Shimokuzawa, Sagamihara, Kanagawa, 229-1198, Japan
Naoya Furutake
Affiliation:
[email protected], NEC Corporation, 1120, Shimokuzawa, Sagamihara, Kanagawa, 229-1198, Japan
Yoshihiro Hayashi
Affiliation:
[email protected], NEC Corporation, 1120, Shimokuzawa, Sagamihara, Kanagawa, 229-1198, Japan
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Abstract

A novel plasma co-polymerization technology, using flexibly-mixed molecular gas of 6-membered ring-type vinyl-siloxane and 8-member ring-type one, has been developed for new interlayer dielectric film.

Keywords

dielectric propertiespolymerizationsemiconducting
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 949: Symposium C – Smart Dielectric Polymer Properties, Characterization and Their Devices , 2006 , 0949-C07-10
Copyright
Copyright © Materials Research Society 2007

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References

REFERENCES

1. Hayashi, Y., Proceedings of IEEE IITC 2002, p145.Google Scholar
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4. Hayashi, Y. et al., Proceedings of IEEE IITC 2004, p225.Google Scholar
5. Ito, F. et al., Proceedings of AMC 2005 p291.Google Scholar