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Morphological Evolution during Growth and Erosion on Vicinal Si(100) Surfaces: From Electronic Structure Analyses to Atomistic and Coarse-Grained Modeling

Published online by Cambridge University Press:  02 March 2012

Da-Jiang Liu ,
David M. Ackerman ,
Xiaofang Guo ,
Marvin A. Albao ,
Luke Roskop ,
Mark S. Gordon  and
James W. Evans
Da-Jiang Liu
Affiliation:
Ames Laboratory – USDOE, Iowa State University, Ames, Iowa 50011, U.S.A.
David M. Ackerman
Affiliation:
Ames Laboratory – USDOE, Iowa State University, Ames, Iowa 50011, U.S.A. Departments of Chemistry, Iowa State University, Ames, Iowa 50011, U.S.A.
Xiaofang Guo
Affiliation:
Ames Laboratory – USDOE, Iowa State University, Ames, Iowa 50011, U.S.A. Departments of Physics & Astronomy, Iowa State University, Ames, Iowa 50011, U.S.A.
Marvin A. Albao
Affiliation:
Ames Laboratory – USDOE, Iowa State University, Ames, Iowa 50011, U.S.A. Departments of Physics & Astronomy, Iowa State University, Ames, Iowa 50011, U.S.A.
Luke Roskop
Affiliation:
Ames Laboratory – USDOE, Iowa State University, Ames, Iowa 50011, U.S.A. Departments of Chemistry, Iowa State University, Ames, Iowa 50011, U.S.A.
Mark S. Gordon
Affiliation:
Ames Laboratory – USDOE, Iowa State University, Ames, Iowa 50011, U.S.A. Departments of Chemistry, Iowa State University, Ames, Iowa 50011, U.S.A.
James W. Evans
Affiliation:
Ames Laboratory – USDOE, Iowa State University, Ames, Iowa 50011, U.S.A. Departments of Physics & Astronomy, Iowa State University, Ames, Iowa 50011, U.S.A.
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Abstract

Stepped Si(100) surfaces exhibit alternating stiff SA and meandering SB steps, and thus constitute a so-called AB-vicinal surface. Both growth by Molecular Beam Epitaxy (MBE) or Chemical Vapor Deposition (CVD), and erosion by ion sputtering or chemical etching, induce step pairing, although different factors contribute. In addition, more complex pattern formation often occurs during step train motion. We synthesize recent developments in modeling of these processes ranging from ab-initio electronic structure approaches for key surface energetics, to atomistic lattice-gas modeling, to coarse-grained sharp-interface (front-tracking) and smeared-interface (phase-field) step dynamics approaches. We briefly describe development of new formalisms related to coarse-grained approaches, as well as selected results for step pairing.

Keywords

molecular beam epitaxy (MBE)sputteringsimulation
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1411: Symposium EE – Self Organization and Nanoscale Pattern Formation , 2012 , mrsf11-1411-ee09-37
Copyright
Copyright © Materials Research Society 2012

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References

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