Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Sorrell, F.Y.
Fordham, M.J.
and
Seungil Yu
1995.
A methodology for analysis of RTCVD systems.
IEEE Transactions on Semiconductor Manufacturing,
Vol. 8,
Issue. 3,
p.
280.
Nagabushnam, R. V.
Singh, R. K.
Sharan, S.
and
Sandhu, G.
1996.
Accurate Estimation of Radiative and Convective Losses in a Multizone RTP Reactor.
MRS Proceedings,
Vol. 429,
Issue. ,
Hazra, Sukti
Yamanaka, Mitsuyuki
Sakata, Isao
Tsutsumi, Toshiyuki
Maeda, Tatsuro
Taguchi, Hirohisa
and
Suzuki, Eiichi
2000.
Spectroscopic Ellipsometry for the Characterization of the Morphology of Ultra-thin Thermal CVD Amorphous and Nanocrystalline Silicon Thin Films.
MRS Proceedings,
Vol. 609,
Issue. ,
Habuka, Hitoshi
Maruyama, Keitaro
and
Suzuki, Takahiro
2001.
Design of a Rapid Thermal Processing System Using a Reflection-Resolved Ray Tracing Method.
Journal of The Electrochemical Society,
Vol. 148,
Issue. 10,
p.
G543.
Hazra, Sukti
Sakata, Isao
Yamanaka, Mitsuyuki
and
Suzuki, Eiichi
2002.
Stress as a governing parameter to control the crystallization of amorphous silicon films by thermal annealing.
Applied Physics Letters,
Vol. 80,
Issue. 22,
p.
4115.
Habuka, Hitoshi
Wada, Tomoyuki
Sakurai, Takashi
Takeuchi, Takashi
and
Aihara, Masahiko
2005.
Heat Balance Evaluation for Rapid Thermal Processing System Design.
Journal of The Electrochemical Society,
Vol. 152,
Issue. 12,
p.
G924.
Liu, Rui
Lin, Xiaowen
Chen, Xi
and
Armaou, Antonios
2024.
34th European Symposium on Computer Aided Process Engineering / 15th International Symposium on Process Systems Engineering.
Vol. 53,
Issue. ,
p.
289.