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Molecular Dynamics Study of Cu Thin Film Deposition onβ-Ta

Published online by Cambridge University Press:  01 February 2011

Peter Klaver  and
Barend J. Thijsse
Barend J. Thijsse
Affiliation:
Delft University of Technology, Department of Materials Science, Rotterdamseweg 137, 2628AL Delft, The Netherlands.
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Abstract

Molecular Dynamics simulations were performed to study Cu film deposition on β-Ta. Three different β-Ta surfaces were used, two being atomically flat, and one resulting from Ta on Ta growth. We find that the Cu films develop a (111) texture with vertical grain boundaries between grains having different epitaxial relations with the β-Ta substrate. The epitaxial rotation angles were determined, as 5.2° and 10-13°, and the resulting strain reductions in the Cu films were identified. The effects of the substrate differences on the interfacial Ta/Cu intermixing and the epitaxy and grain boundary structure of the films are discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 721: Symposia E/J – Texture and Microstructure in Electronic and Magnetic Films – Nanostructural Magnetic Materials for Data Storage , 2002 , J2.3
Copyright
Copyright © Materials Research Society 2002

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