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Microstructure and Physical Properties of Ferroelectric-gate Memory Capacitors with Various Buffer Layers
Published online by Cambridge University Press: 21 March 2011
Abstract
This paper reports the microstructure and physical properties of ferroelectric capacitors formed from SrBi2Ta2O9(SBT) layers on Si with various buffer layers including jet-vapor deposited silicon nitride, zirconium oxide, hafnium oxide and thermally grown silicon oxide. Results from cross-sectional transmission electron microscopy (X-TEM), energy dispersive spectroscopy (EDS), X-Ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and non-contact atomic force microscopy (nc-AFM) data coupled with capacitance-voltage (C-V) and current- voltage (I-V) data indicate that both the microstructure and physical properties of SBT films deposited on silicon are dependent on the buffer layer material employed.
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- Copyright © Materials Research Society 2001