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Microstructural evolution during mechanical treatment of ZnO and black NiO powder mixture

Published online by Cambridge University Press:  19 November 2013

M. Kakazey ,
M. Vlasova ,
Y. Vorobiev ,
I. Leon ,
M. Cabecera Gonzalez  and
E.A. Chávez Urbiola
M. Kakazey*
Affiliation:
CIICAp-Universidad Autonoma del Estado de Morelos, Cuernavaca, Mexico
M. Vlasova
Affiliation:
CIICAp-Universidad Autonoma del Estado de Morelos, Cuernavaca, Mexico
Y. Vorobiev
Affiliation:
Unidad Querétaro del CINVESTAV-IPN, Querétaro, Mexico
I. Leon
Affiliation:
CIQ-Universidad Autonoma del Estado de Morelos, Cuernavaca, Mexico
M. Cabecera Gonzalez
Affiliation:
FCQI-Universidad Autonoma del Estado de Morelos, Cuernavaca, Mexico
E.A. Chávez Urbiola
Affiliation:
Unidad Querétaro del CINVESTAV-IPN, Querétaro, Mexico
*
*Email: [email protected]
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Abstract

Kinetics of the microstructural evolution in ZnO and NiO black powder mixture during prolonged mechanical processing (MP) was investigated by Scanning electron microscopy (SEM), Laser Particle Sizer (LPS), X-ray diffraction, electron paramagnetic resonance (EPR), infrared absorption (FTIR) and UV-Visible diffuse reflection methods.

Keywords

NiO powderZnO powderpowder
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1617: Symposium 7E – Low-Dimensional Semiconductor Structures , 2013 , pp. 107 - 112
Copyright
Copyright © Materials Research Society 2013 

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References

REFERENCES

Xi, Y. Y., Hsu, Y. F., Djurišić, A. B., Ng, A. M. C., Chan, W. K., Tam, H. L., Cheah, K. W., Appl. Phys. Lett. 92, 113505 (2008).Google Scholar
Long, H., Fang, G., Huang, H., Mo, X., Xia, W., Dong, B., Meng, X., Zhao, X., Appl. Phys. Lett. 95, 013509 (2009).Google Scholar
Ohta, H., Hirano, M., Nakahara, K., Maruta, H., Tanabe, T., Kamiya, M., Kamiya, T., Hosono, H., Appl. Phys. Lett. 83, 1029 (2003).CrossRefGoogle Scholar
Cavas, M., Gupta, R. K., Al-Ghamdi, A. A., Al-Hartomy, O.A., El-Tantawy, F., Yakuphanoglu, F., Sol-Gel, J.. Sci. Technol. 64, 219–223 (2012).Google Scholar
Srivastava, P., Ghosh, S., Joshi, B., Satyarthi, P., Kumar, P., Kanjilal, D., Buerger, D., Zhou, S., Schmidt, H., Rogalev, A., Wilhelm, F., J. Appl. Phys. 111, 013715 (2012).Google Scholar
Klug, H.P., Alexander, L.E., X-ray Diffraction Procedures for Polycrystalline and Amorphous Materials, 2nd edition, J. Wiley & Sons, New York, 1974.Google Scholar
Roth, W.L., Phys. Rev. B 110, 1333 – 1341 (1958).CrossRefGoogle Scholar
Gad, S. A., Boshta, M., Aboel-Soud, A. M., Mostafa, M. Z., Fizika A 18, 173–184 (2009).Google Scholar
Rubinstein, M., Kodama, R.H., Makhlouf, S.A., JMMM, 234, 289–293 (2001).CrossRefGoogle Scholar
Kakazey, M.G., Sreckovic, T.V., Ristic, M.M., J. Mater. Sci. 32, 4619 – 4622 (1997).CrossRefGoogle Scholar
Kakazey, M. G., Vlasova, M., Dominguez-Patiño, M., Dominguez-Patiño, G., Gonzalez-Rodriguez, G., Salazar-Hernandez, B., J. Appl. Phys. 92, 5566 (2002).CrossRefGoogle Scholar
Schallenberger, B., Hausmann, A., Z.Physik B 23, 177–181 (1976).CrossRefGoogle Scholar
Galland, D., Herve, A., Sol. St. Comm. 14, 953 – 956 (1974).CrossRefGoogle Scholar
Kakazey, M., Vlasova, M., Dominguez-Patiño, M., Leon, I., Ristic, M., J. Mater. Sci. 42 7116–7122 (2007).CrossRefGoogle Scholar
Hayashi, S., Nakamori, N., Kanamori, H., J. Phys. Soc. Jpn. 46, 176 – 183 (1979).CrossRefGoogle Scholar
Kakazey, M.G., Melnikova, V.A., Sreckovic, T., Tomila, T.V., Ristic, M.M., J. Mater. Sci. 34 1691 – 1697 (1999).CrossRefGoogle Scholar
Bamford, C.R., Color Generation and Control in Glasses, Elsevier, Amsterdam (1977).Google Scholar
Kubelka, P., Monk, F., Z. Tech. Phys. 12, 593–608 (1931).Google Scholar
Yalishev, V.S., Kim, Y.S., Deng, X.L., Park, B.H., Yuldashev, Sh.U., J. Appl. Phys. 112 013528 (2012).CrossRefGoogle Scholar
Tan, S. T., Chen, B. J., Sun, X. W., Fan, W.J., J. Appl. Phys. 98, 013505 (2005).Google Scholar
Nandy, S., Maiti, U.N., Ghosh, C.K., Chattopadhyay, K.K., J. Phys.: Condens. Matter. 21 115804 (2009).Google Scholar
Djurišić, A. B., Choy, W. C. H., Roy, V. A. L., Leung, Y. H., Kwong, C. Y., Cheah, K. W., Gundu Rao, T. K., Chan, W. K., Fei Lui, H., Surya, C., Adv. Funct. Mater. 14, 856–864 (2004).CrossRefGoogle Scholar
Scepanovic, M., Grujic-Brojcin, M., Vojisavljevic, K., Sreckovic, T., J. Appl. Phys. 109 034313 (2011).CrossRefGoogle Scholar