Hostname: page-component-586b7cd67f-l7hp2 Total loading time: 0 Render date: 2024-11-24T14:43:13.765Z Has data issue: false hasContentIssue false
  • English
  • Français

Micromechanical Modelling of Ferroelectric Films

Published online by Cambridge University Press:  01 February 2011

J. E. Huber
J. E. Huber*
Affiliation:
Department of Engineering, University of Cambridge, Trumpington St, Cambridge, CB2 1PZ, UK
Get access

Abstract

Ferroelectric films are growing in significance as non-volatile memory devices, sensors and microactuators. The stress state of the film, induced by processing or constraints such as the substrate, strongly affects device behaviour. Thus it is important to be able to model the coupled and constrained behaviour of film material. This work presents a preliminary study of the application of micromechanical modelling to ferroelectric films. A self-consistent micromechanics model developed for bulk ferroelectrics is adapted for thin film behaviour by incorporating features such as grain structure, mechanical clamping by the substrate, residual stresses, and crystallographic orientation of the film.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 881: Symposium CC – Coupled Nonlinear Phenomena Modeling and Simulation for Smart, Ferroic and Multiferroic Materials , 2005 , CC5.2
Copyright
Copyright © Materials Research Society 2005

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Spierings, G.A.C.M., Dormans, G.J.M., Moors, W.G.J, Ulenaers, M.J.E., and Larsen, P.K.. Journal of Applied Physics, 78:1926–1933, 1995.Google Scholar
2 Huber, J.E., Fleck, N.A., Landis, C.M., and McMeeking, R.M.. Journal of the Mechanics and Physics of Solids, 47:1663–1697, 1999.Google Scholar
3 Huber, J.E. and Fleck, N.A. Journal of the Mechanics and Physics of Solids, 49:785–811, 2001.Google Scholar
4 Lian, L. and Sottos, N.R.. Journal of Applied Physics, 87:3941–3949, 2000.Google Scholar
5 Michelitsch, T. and Levin, V.M.. European Physical Journal B, 14:527–533, 2000.Google Scholar
6 Merz, W.J.. Physical Review, 95:690–698, 1954.Google Scholar
7 Loge, R.E. and Suo, Z.. Acta Materialia, 44:3429–3438, 1996.Google Scholar
8 Ganpule, C.S., Nagarajan, V., Ogale, S.B., Roytburd, A.L., Williams, E.D., and Ramesh, R.. Applied Physics Letters, 77:3275–3277, 2000.Google Scholar
9 Lo, V.C.. Journal of Applied Physics, 94:3353–3359, 2003.Google Scholar
10 Dawber, M., Chandra, P., Littlewood, P.B., and Scott, J.F.. Journal of Physics: Condensed Matter, 15:L393–L398, 2003.Google Scholar