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Method for Measuring Profiles of Photoacid Patterns in Chemically Amplified Resists

Published online by Cambridge University Press:  17 March 2011

Gilbert D. Feke ,
Robert D. Grober ,
Gerd Pohlers  and
James F. Cameron
Gilbert D. Feke
Affiliation:
Department of Applied Physics, Yale University, New Haven, CT 06520-8284, U.S.A.
Robert D. Grober
Affiliation:
Department of Applied Physics, Yale University, New Haven, CT 06520-8284, U.S.A.
Gerd Pohlers
Affiliation:
Microelectronic Materials Research and Development Laboratories, Shipley Company, Marlborough, MA 01752, U.S.A.
James F. Cameron
Affiliation:
Microelectronic Materials Research and Development Laboratories, Shipley Company, Marlborough, MA 01752, U.S.A.
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Abstract

We describe a method based on single molecule probing of acid concentration to measure the profiles of photogenerated acid patterns in chemically amplified resist films. We further present preliminary data which demonstrates the viability of this method.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 636: Symposium D – Nonlithographic and Lithographic Methods of Nanofabrication-From Ultralarge Scale , 2000 , D6.7.1
Copyright
Copyright © Materials Research Society 2001

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