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Metalorganic Chemical Vapor Deposition of Magneto-Optical Ce:YIG Thin Films

Published online by Cambridge University Press:  10 February 2011

Yi-Qun Li ,
Mondher Cherif ,
Jankang Huang ,
Wayne Liu  and
Qiushui Chen
Yi-Qun Li
Affiliation:
NZ Applied Technology, 8-A Gill Street, Wobum, MA 01801
Mondher Cherif
Affiliation:
NZ Applied Technology, 8-A Gill Street, Wobum, MA 01801
Jankang Huang
Affiliation:
NZ Applied Technology, 8-A Gill Street, Wobum, MA 01801
Wayne Liu
Affiliation:
NZ Applied Technology, 8-A Gill Street, Wobum, MA 01801
Qiushui Chen
Affiliation:
NZ Applied Technology, 8-A Gill Street, Wobum, MA 01801
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Abstract

The deposition technologies of rare-earth substituted yttrium iron garnet (RE:YIG) thin films with a large Faraday rotation and their applications are briefly overviewed. Highly cerium substituted YIG films were successfully deposited on (111) GGG, (211) GGG, (100) MgO, and MgO buffered GaAs and InP substrates by single-liquid-source metalorganic chemical vapor deposition. Ce-YIG thin films can be epitaxially grown on lattice matched GGG substrates at a temperature as low as 600°C. They have excellent optical and magnetic properties along with high Faraday rotations. The films deposited on single crystal (100) MgO substrates are polycrystalline and have good magnetic properties. Sputter deposited MgO buffer layer was demonstrated for preventing the decomposition and chemical reaction of GaAs and LnP substrates resulting in successful deposition of YIG films on GaAs and InP substrates at a substrate temperature of 550°C. The films grown on MgO buffered GaAs substrates possessed good magnetic properties.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 517: Symposium F – Wide Bandgap Semiconductors for High Power, High Frequency , January 1998 , 449
Copyright
Copyright © Materials Research Society 1998

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References

1. Wolf, R., Hegarty, J., Luther, L. C., and Wood, D. L., Appl. Phys. Lett. 48 (1986) 508.10.1063/1.96489Google Scholar
2. Wolf, R., Fratello, V. J., and , McGlashan-Powell, Appl. Phys. Lett. 51 (1987) 1221.10.1063/1.98736Google Scholar
3. Wolf, R., Lieberman, R. A., Fratello, V. J., Scotti, R. E., and Kopylov, N., 56 (1990) 426.Google Scholar
4. Wolf, R., Dillon, J. F. Jr, Lieberman, R. A., and Fratello, V. J., Appl. Phys. Lett. 57 (1990) 960.10.1063/1.103525Google Scholar
5. Pross, E., Tolksdorf, W., and Dammann, H., Appl. Phys. Lett. 52 (1988) 682.10.1063/1.99346Google Scholar
6. Dammann, H., Pross, E., Rabe, G., and Tolksdorf, W., Appl. Phys. Lett. 56 (1990) 1302.10.1063/1.102501Google Scholar
7. Wolf, R., Thin Solid Films, 216 (1992) 184.10.1016/0040-6090(92)90892-FGoogle Scholar
8. Suzuki, T., MRS Bulletin, September, 1996, p43.Google Scholar
9. Suzuki, T., Sequeda, F., Do, H., Huang, T. C., and Gorman, G., J. Appl. Phys. 69 (1991) p4756.10.1063/1.348271Google Scholar
10. Duran, C. A., Gammel, P. L., Wolf, R., Fratello, V. J., Bishop, D. J., Rice, J. P. and Ginsberg, D. M., Nature, 357 (1992) 474.10.1038/357474a0Google Scholar
11. Dorosinskii, L. A., Indenbom, M. V., Nikitenko, V. I., Ossip'yan, Yu. A., Polyanski, A. A., and Vlasko-Vlasov, V. K., Physica C 203 (1992) 149.10.1016/0921-4534(92)90521-DGoogle Scholar
12. Gornakov, V. S. and Nikitenko, V. I., Bennett, L. H., Brown, H. J., Donahue, M. J., Egelhoff, W. F., McMichael, R. D., and Shapiro, A. J., J. Appl. Phys. 81 (1997) 5215.10.1063/1.364954Google Scholar
13. Gomi, M., Furuyama, H. and Abe, M., Jap. J. Appl. Phys. 29 (1990) L99.10.1143/JJAP.29.L99Google Scholar
14. Shintaku, T., Uno, T., and Kobayashi, M., J. Appl. Phys. 74 (1993) 4877.10.1063/1.354318Google Scholar
15. Okuda, T., Koshizuka, N., Hayashi, K., Takahashi, T., Kotani, H., and Yamamoto, H., IEEE Trans. Magn. MAG–23 (1987) 3491.10.1109/TMAG.1987.1065531Google Scholar
16. Okuda, T., Katayama, T., Satoh, K., and Yamamoto, H., J. Appl. Phys. 69 (1991) 4580.10.1063/1.348316Google Scholar
17. Simion, B. M., Ramesh, R., Keramidas, V. G., Thomas, G., Marinero, E., Pfeffer, R. L., J. Appl. Phys. 76 (1994) 6287.10.1063/1.358307Google Scholar
18. Manifacier, J., Gasito, J., Fillard, J., J. Physics E, 9 (1976) 1002.10.1088/0022-3735/9/11/032Google Scholar