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Metallisation and Silicidation of Porous Silicon

Published online by Cambridge University Press:  22 February 2011

Bernard J. Aylett ,
Lyndsay G. Earwaker  and
John M. Keen
Bernard J. Aylett
Affiliation:
Dept. of Chemistry, Queen Mary and Westfield College, London El 4NS, U.K.
Lyndsay G. Earwaker
Affiliation:
Dept. of Physics and Space Research, University of Birmingham, U.K.
John M. Keen
Affiliation:
DRA-Royal Signals and Radar Establishment, Electronics Division, Malvern, U.K.
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Abstract

Thin films of cobalt, rhenium, or cobalt silicide have been deposited down the pores of porous silicon layers, using HCo(CO)4, HRe(CO)5, and SiH3Co(CO)4 as precursors in a Chemical Vapour Infiltration and Decomposition (CVID) technique.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 282: Symposium E – Chemical Perspectives of Microelectronic Materials III , 1992 , 281
Copyright
Copyright © Materials Research Society 1993

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References

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