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Metal Induced Crystallization of Amorphous Silicon Thin Films

Published online by Cambridge University Press:  25 February 2011

T. Hempel ,
O. Schoenfeld  and
P. Veit
T. Hempel
Affiliation:
Technische Universität Magdeburg, Institut für Experimentelle Physik, O-3010 Magdeburg, Germany
O. Schoenfeld
Affiliation:
Technische Universität Magdeburg, Institut für Experimentelle Physik, O-3010 Magdeburg, Germany
P. Veit
Affiliation:
Technische Universität Magdeburg, Institut für Experimentelle Physik, O-3010 Magdeburg, Germany
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Abstract

The crystallization behaviour of Ni doped magnetron co-sputtered amorphous silicon thin films (MSP-a-Si(Ni)) has been investigated by means of near infrared-visible-ultraviolet (NIR-VIS-UV) transmission spectroscopy, transmission electron microscopy (TEM) and scanning transmission electron microscopy (STEM). Using the change in optical transmission spectra of crystallized a-Si(Ni) thin films the crystallization kinetics is described. At the crystallization frontier a needle morphology of single crystals is observed with STEM, which is followed by solid state diffusion of nickel through the amorphous matrix. Using a long term thermal treatment we have studied the formation of expansed monocrystalline networks.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 279: Symposium A – Beam-Solid Interactions–Fundamentals and Applications , 1992 , 267
Copyright
Copyright © Materials Research Society 1993

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References

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