No CrossRef data available.
Published online by Cambridge University Press: 26 February 2011
Melting velocities in silicon were measured on a picosecond time scale by employing pump-probe and self-reflectivity measurements. The pump laser was a 40 picosecond XeCl excimer (308 am) and the probe a dye laser at 600 am. Samples were phosphorous doped silicon wafers. Average melt-in velocities as high as 800 m/s were observed. Best fit to the data was achieved with an asymmetric transient state theory model.