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Melting and Solidification Dynamics in Zone Melting of Si Films.

Published online by Cambridge University Press:  28 February 2011

D. Dutartre*
Affiliation:
Centre National d'Etudes des Télécommunications, B. P 98, 38243, Meylan cedex, France
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Abstract

We discuss the physics involved in the melting and solidification of Silicon On Insulator thin films (SOI) using lamp or graphite strip heaters. The melting front, called “explosive melting”, controls to a large part the final morphological quality of the SOI film. It exhibits instabilities which can (i) nucleate the dewetting of the film, (ii) cause voids, and (iii) produce a poor surface morphology. The morphologies of the solidification fronts are analyzed. We show that, depending on the experimental conditions, different physical mechanisms are responsible for the front breakdown. Thus we propose that the variety of front morphologies results from the variety of the mechanisms involved, and of their combinations with the “faceting effects”.

Type
Research Article
Copyright
Copyright © Materials Research Society 1988

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References

1 See for example, Fan, J. C. C, Tsaur, B.Y, and Geis, M.W, J. Cryst.Growth 63, 453 (1983).CrossRefGoogle Scholar
2 See for example, Kamgar, A., and Labate, E., Mater. Letter 1, 91 (1982).CrossRefGoogle Scholar
3 Dutartre, D., Appl. Phys. Lett. 48, 350 (1986).CrossRefGoogle Scholar
4 Dutartre, D., unpublished results.Google Scholar
5 Dutartre, D., to be published.Google Scholar
6 Chen, C. K., Geis, M. W., Tsaur, B. Y., Chapman, R. L., and Fan, J. C. C., J. Electrochem. Soc., 131, 1707 (1984).CrossRefGoogle Scholar
7 Geis, M. W., Smith, H. I., Tsaur, B. Y., Fan, J. C. C., Silversmith, D. J., and Mountain, R. W., J. Electrochem. Soc., 129, 2812 (1982).CrossRefGoogle Scholar
8 Geis, M. W., Chen, C. K., Smith, H. I., Nitishin, P. M., Tsaur, B. Y., Mountain, R. W., in MRS Proceedings, Vol. 53, edited by Chiang, A., Geis, M.W., Pfeiffer, L., (Materials Research society, Pittsburg P.A. 1986), p 39.Google Scholar
9 Pfeiffer, L., Gelman, A. E., Jackson, K. A., and West, K. W. in MRS Proceedings, Vol. 74, edited by Picraux, S. T., Thomson, M. O., and Williams, J. S., (Materials Research society, Pittsburg P.A. 1986), p 543.Google Scholar
10 Geis, M. W., Smith, H. I., Silversmith, D. J., Mountain, R. W., and Thompson, C. V., J. Electrochem. Soc., 130, 1178 (1983).CrossRefGoogle Scholar
11 Leamy, H. J., Chang, C. C., Baumgart, H., Lemons, R. A., and Cheng, J., Mater. Lett. 1, 33 (1982).CrossRefGoogle Scholar
12 Limonov, A. B., and Givargisov, E. I., Mater. Lett. 2, 93 (1983).CrossRefGoogle Scholar
13 Im, J. S., Tomita, H., Thompson, C. V., Appl. Phys. Lett. 51, 685 (1986).CrossRefGoogle Scholar
14 Fan, J. C. C., Tsaur, B. Y., Chen, C. K., Dick, J. R., and Kazmerski, L. L., Appl. Phys. Lett. 44,1086 (1984).CrossRefGoogle Scholar
15 Dutartre, D., Haond, M., and Bensahel, D., J. Appl. Phys. 59, 682 (1986)Google Scholar
16 Geis, M. W., Chen, C. K., Smith, H. I., Mountain, R. W., and Doherty, C. L., in MRS Proceedings, Vol. 35, edited by Biegelsen, D. K., Rozgonyi, G. A. and Shank, C. V., (Materials Research society, Pittsburg P.A. 1985), p 575.Google Scholar
17 Geis, M. W., Smith, H. I., and Chen, C. K., J. Appl. Phys. 60, 1152 (1986).CrossRefGoogle Scholar
18 Pfeiffer, L., Paine, S., Gilmer, G. H., Saarloos, W., and West, K. W., Phys. Rev. Lett. 54, 1944 (1985).CrossRefGoogle Scholar
19 Woodruff, D. P., The solid-liquid interface (Cambridge University, New York, 1973).Google Scholar
20 Ciszek, T. F., J. Electrochem. Soc., 132, 422 (1985).CrossRefGoogle Scholar
21 Bardsley, W., Boulton, J. S., and Hurle, D. T. J., Solid-State Electron. 5, 395 (1962).CrossRefGoogle Scholar
22 Bosh, M.A., and Lemons, R.A., Phys. Rev. Lett. 47, 1151 (1981).CrossRefGoogle Scholar
23 Hawkins, W. G., Biegelsen, D. K., Appl. Phys. Lett. 42, (1983) 358.CrossRefGoogle Scholar
24 Grigopoulos, C. P., Buckholz, R. H., and Tomoto, G. A., J. Appl. Phys., 59, 454, (1986).CrossRefGoogle Scholar
25 Lee, E. H., Mat. Lett. 3, 73 (1985).CrossRefGoogle Scholar
26 Yablonovitch, E. and Gmitter, T., J. Electrochem. Soc.,131, 2625 (1984).CrossRefGoogle Scholar