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MBE-Growth of Iron and Iron Oxide Thin Films on MgO(1OO), Using NO2, NO, and N2O as Oxidising Agents

Published online by Cambridge University Press:  15 February 2011

F. C. Voogt ,
T. Hibma ,
P.J.M. Smulders ,
L. Iesen  and
T. Fujii
F. C. Voogt
Affiliation:
Materials Science Centre, University of Groningen, Nijenborgh 4, 9747 AG, Groningen, The Netherlands, [email protected].
T. Hibma
Affiliation:
Materials Science Centre, University of Groningen, Nijenborgh 4, 9747 AG, Groningen, The Netherlands, [email protected].
P.J.M. Smulders
Affiliation:
Materials Science Centre, University of Groningen, Nijenborgh 4, 9747 AG, Groningen, The Netherlands, [email protected].
L. Iesen
Affiliation:
Materials Science Centre, University of Groningen, Nijenborgh 4, 9747 AG, Groningen, The Netherlands, [email protected].
T. Fujii
Affiliation:
Department of Applied Chemistry, Faculty of Engineering, Okayama University, Tsushima-naka 3–1–1, Okayama 700, Japan.
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Abstract

We have made a study of the use of NO2 as the source of oxygen in the MBE-growth of iron oxides thin films. It is found that NO2 is a much more efficient oxidising agent than molecular O2. As indicated by Mössbauer spectroscopy, performed on 57Fe probe layers, NO2 is not only capable of forming stoichiometric magnetite Fe3O41 but also all non-stoichiometric Fe3-δO4 phases. Even the metastable maghemite phase γ-Fe2O3 (Fe3-δO4 with δ=1/3) can be formed. All iron oxides grow layer-by-layer-like, as indicated by strong RHEED intensity oscillations. When small doses of NO2 are used, new wustite Fe3-xO and Fe3O4 phases are formed. In contrast to the Fe3-δO4 films, these phases have nitrogen incorporated into the crystal lattice. Similar compounds are obtained when NO is used as the source of oxygen. The use of N2O does not lead to the formation of iron oxides. It does, however, alter the growth mode of Fe on MgO(100). Whereas Fe deposited under UHV conditions forms 3D islands, the N2O acts as a surfactant and induces 2D layer-by-layer growth.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 474: Symposium L – Epitaxial Oxide Thin Films III , 1997 , 211
Copyright
Copyright © Materials Research Society 1997

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References

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