Hostname: page-component-745bb68f8f-f46jp Total loading time: 0 Render date: 2025-01-27T03:23:50.219Z Has data issue: false hasContentIssue false
  • English
  • Français

Magnetic Properties of Gadolinium Silicide Thin Films for Different Heat Treatments

Published online by Cambridge University Press:  15 February 2011

C. Pescher ,
J. Pierre ,
A. Ermolieff  and
C. Vannuffel
C. Pescher
Affiliation:
LETI, CEA, Technologies Avancées DOPT/CPM, 17g Avenue des Martyrs, 38054 Grenoble, cedex 9, France
J. Pierre
Affiliation:
CNRS, Laboratoire de Magnétisme Louis Néel, 25 avenue des Martyrs, BP166, 38042, Grenoble cedex 9, France
A. Ermolieff*
Affiliation:
LETI, CEA, Technologies Avancées DOPT/CPM, 17g Avenue des Martyrs, 38054 Grenoble, cedex 9, France
C. Vannuffel
Affiliation:
CNRS, Laboratoire de Magnétisme Louis Néel, 25 avenue des Martyrs, BP166, 38042, Grenoble cedex 9, France
*
corresponding author
Get access

Abstract

The magnetic properties of heavy rare earth silicide GdSi2-x thin films are investigated as a function of the annealing temperature of the films. Resistivity measurements reveal in the two films annealed at high and low temperatures, but for a short time, the existence of two transition temperatures corresponding to the presence of an ordered and a disordered structure. In the film annealed at high temperature for a long time, only one transition temperature occurs. It corresponds to a magnetic structure transformation.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 384: Symposium L – Magnetic Ultrathin films, Multilayers and Surfaces , 1995 , 283
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Pescher, C., Ermolieff, A., Veuillen, J.Y., Tan, T. Nguyen, submitted to Solid State CommunicationGoogle Scholar
2. Lee, T.L., Chen, L.J., Chen, F.R., J. Appl. Phys. 33,(1992), p. 2089 Google Scholar
3. Kaatz, F.H., Graham, W.R., Spiegel, J. Van der, Appl. Phys. Lett. 62 (15) (1993), p. 1748 Google Scholar
4. Vannuffel, C., to be published in the Proceedings of the Inst. Phys. Conf., Micros. Semic. Mat., Oxford, 20-23 March 1995 Google Scholar
5. Auffret, S., Pierre, J., Lambert-Andron, B., Madar, R., Houssay, E., Schmitt, D. and Siaud, E., Physica B 173 (1991), p. 265, and references thereinGoogle Scholar
6. Pierre, J., Auffret, S., Chroboczek, J.A. and Nguyen, T.T.A., J. Phys. Cond. Matter 6 (1994), p. 79 Google Scholar
7. Pescher, C.: thèse de Doctorat de l'Institut National Polytechnique de Grenoble 1995 Google Scholar
8. Madar, R., Houssay, E., Rouault, A., Senateur, J.P., Lambert, B., d'Anterroches, C. Meneau, Pierre, J., Pelissier, J., J. Mat. Res. 5, 10 (1990), p. 2126Google Scholar
9. Andron, B. Lambert-, Pierre, J., Chenevier, B., Madar, R., Boutarek, N., Carvajal, J. Rodriguez-, J. Phys. Cond. Mat. 6 (1994), p. 8725 Google Scholar
10. Andron, B. Lambert-, Boutarek, N., Pierre, J., Madar, R., J. of Alloys and compounds 203 (1994), p. 1 Google Scholar
11. Schobinger-Papamantellos, P., Buschow, K.H.J., J. Less Common Met. 146 (1989), p. 279Google Scholar
12. Yamada, H., Takada, S., J. Phys Soc Japan, 34 (1975), p. 51 Google Scholar