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Magnetic and Magneto-Optic Properties of dc Magnetron Sputtered Co-Cr/Al Multilayers

Published online by Cambridge University Press:  03 September 2012

G.W. Auner ,
R. Naik ,
U.M. Rao ,
Y. Zhao  and
B. Wang
G.W. Auner
Affiliation:
Department of Electrical and Computer Engineering, Wayne State University, Detroit, MI 48202
R. Naik
Affiliation:
Department of Electrical and Computer Engineering, Wayne State University, Detroit, MI 48202
U.M. Rao
Affiliation:
Department of Electrical and Computer Engineering, Wayne State University, Detroit, MI 48202
Y. Zhao
Affiliation:
Department of Electrical and Computer Engineering, Wayne State University, Detroit, MI 48202
B. Wang
Affiliation:
Department of Electrical and Computer Engineering, Wayne State University, Detroit, MI 48202
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Abstract

Single layers of Co82?l8 with thickness in me ranee of 100–1500Å and multilayers of Co-Cr/Al with Co-Cr thickness in the range of 100–200A and Al at 7Å were prepared by dc magnetron sputtering. The films were deposited on to Si (111) and glass substrates at room temperature. A 100Å thick Al buffer layer was deposited to improve the c-axis orientation. X-ray diffraction (XRD) Measurements on the multilayers show a predominant Co-Cr (00.2) peak. Polar Magneto-optic measurements were performed to determine the Kerr rotation (θK) and figure of Merit. The results indicated an enhancement in the figure of merit at λ = 632.8 nm for the multilayered structures compared to single layer samples. All of the films show a 4πMs value around 6 kG and ferromagnetic resonance measurements indicate an enhancement in the perpendicular anisotropy field for the 150Å multilayered sample.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 313: Symposium Q1 – Magnetic Ultrathin Films, Multilayers and Surfaces/Magnetic Interfaces-Physics and Characterizations , 1993 , 785
Copyright
Copyright © Materials Research Society 1993

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References

REFERENCES

1. Iwasaki, S. and Ouchi, K., IEEE Trans. Mag. MAG-14, 849 (1978)Google Scholar
2. Chen, C. W., J. Mater. Sc., 26, 1705 (1991).Google Scholar
3 Fisher, R. D., Au Yeung, V. S. and Sabo, B. B., IEEE Trans. Mag. MAG-20, 806 (1984).Google Scholar
4. Masuya, H. and Awano, H., IEEE Trans. Mag., MAG-23, 2064 (1987).Google Scholar
5. Snyder, J. E., Kryder, M. H. and Wynblatt, P., J. Appl. Phys. 67, 5172 (1990).Google Scholar
6. Demczyk, B. G. and Artman, J. O., J. Phys. D 24, 1627 (1991).Google Scholar
7. Mitchell, P. V., Layadi, A., VanderVen, N. S. and Artman, J. O., J. Appl. Phys. 57, 3976 (1985).Google Scholar
8. Ma, C. L. and Schwerdtfeger, C. F., Solid State Comm. 64, 651 (1987)Google Scholar
9. Tsutsumi, K., Fujii, Y., Komori, M., Numata, T. and Sakurai, Y., IEEE Trans. Mag. MAG-19, 1760 (1983).Google Scholar
10. Hirata, T. and Naoe, M., IEEE Trans. Mag. MAG-28, 2964 (1992).Google Scholar
11. Lenane, T., Development of a pulsed r.f. Magnetron sputtering system with activated/dissociated nitrogen bombardment for the growth of III-V nitride heterostmctures. Masters Thesis, Wayne State University, Department of Electrical and Computer Engineering, 1993.Google Scholar
12. Hogue, K. L., Kota, C. and Naik, H. M., Structure and Properties of Interfaces and Materials/1992, edited by Clark, W. A. T., Dahmen, U., Briant, C. L. (Mater. Res. Soc. Proc. 238, Pittsburgh, PA 1992), p341.Google Scholar