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Low-Coverage Laser Desorption of Ions on Chlorinated Copper Surfaces

Published online by Cambridge University Press:  26 February 2011

L. Chen ,
V. Liberman ,
J.A. O'Neill  and
R.M. Osgood Jr.
L. Chen
Affiliation:
Microelectronics Sciences Laboratories, Columbia University, New York, New York 10027
V. Liberman
Affiliation:
Microelectronics Sciences Laboratories, Columbia University, New York, New York 10027
J.A. O'Neill
Affiliation:
Microelectronics Sciences Laboratories, Columbia University, New York, New York 10027
R.M. Osgood Jr.
Affiliation:
Microelectronics Sciences Laboratories, Columbia University, New York, New York 10027
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Abstract

Experiments were performed to investigate the pulsed excimer laser etching of a chlorinated copper substrate. Time-of-flight mass spectrometric techniques were employed to characterize the mass and velocity distributions of both neutral and ionic species that desorb at laser fluences less than that required to melt bulk Cu or CuCl substrates. The presence of positively charged ions in this work is examined in terms of both photon and electron mediated desorption mechanisms.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 101: Symposium B – Laser and Particle-Beam Chemical Processing for Microelectronics , 1987 , 463
Copyright
Copyright © Materials Research Society 1998

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References

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