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Low Temperature Crystallization of SrBi2Ta2O9 Film by Excimer Laser Irradiation
Published online by Cambridge University Press: 10 February 2011
Abstract
Using a KrF or ArF excimer laser as an irradiation photon source, we have succeeded in crystallizing amorphous SrBi2Ta2O9 films at 200-290°C, quite lower temperatures than the conventional crystallization temperature. The crystallization is enhanced when the substrate temperature, irradiation time, or the laser power density is higher.
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- Copyright © Materials Research Society 1999