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Layer-by-layer Stacking Method for 3-D Nano Structure Fabrication Using Block Copolymer Self Assembly

Published online by Cambridge University Press:  01 February 2011

Shin’ichi Warisawa
Affiliation:
Department of Mechanical Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo Bunkyo-ku, Tokyo 113-8656, Japan
Ryosuke Kanameda
Affiliation:
Department of Mechanical Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo Bunkyo-ku, Tokyo 113-8656, Japan
Reo Kometani
Affiliation:
Department of Mechanical Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo Bunkyo-ku, Tokyo 113-8656, Japan
Sunao Ishihara
Affiliation:
Department of Mechanical Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo Bunkyo-ku, Tokyo 113-8656, Japan
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Abstract

In this paper, we present layer-by-layer stacking method to fabricate self-assembled structures of block copolymers (BCP) toward the out-of-plane direction. Layer-by-layer stacking is realized by transferring a BCP film on one substrate to another. Specifically, a water-soluble polymer film is coated on the former substrate, which is placed and fixed in contact with a target substrate. Consequently, the BCP film is released from the substrate and transferred to the target substrate when immersed in de-ionized water. In our experiment, PS-b-PMMA is used to form and transfer self-assembled structures, and polyvinyl alcohol is used as a water-soluble polymer. We prepared two kinds of target substrates; one has horizontal cylindrical structures by BCP self assembly, and the other has groove structures by EB lithography. In the case of BCP patterned substrate, BCP film with vertical cylindrical structures is transferred onto the line structures of BCP. In the case of EB lithography patterned substrate, BCP film with vertical cylindrical structures is transferred in a doubly suspended condition. Furthermore, vertical and horizontal cylindrical structures are also observed to align along the grooves.

Type
Research Article
Copyright
Copyright © Materials Research Society 2011

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References

REFERENCES

1. Stoykovich, M.P., et al. , Directed assembly of block copolymer blends into nonregular device-oriented structures . Science (New York, N.Y.), 2005. 308: pp. 14421446.Google Scholar
2. Segalman, R.A., Yokoyama, H., and Kramer, E.J., Graphoepitaxy of Spherical Domain Block Copolymer Films . Advanced Materials, 2001. 13: pp. 11521155.Google Scholar
3. Yang, J.K.W., et al. , Complex self-assembled patterns using sparse commensurate templates with locally varying motifs . Nature nanotechnology, 2010. 5: pp. 256260.Google Scholar
4. Bita, I., et al. , Graphoepitaxy of self-assembled block copolymers on two-dimensional periodic patterned templates . Science (New York, N.Y.), 2008. 321: pp. 939943.Google Scholar
5. Chen, Z., Pathways to Macroscale Order in Nanostructured Block Copolymers . Science, 1997. 277: pp. 12481253.Google Scholar
6. Angelescu, D.E., et al. , Shear-Induced Alignment in Thin Films of Spherical Nanodomains . Advanced Materials, 2005. 17: pp. 18781881.Google Scholar
7. Thurn-Albrecht, T., et al. , Ultrahigh-density nanowire arrays grown in self-assembled diblock copolymer templates . Science (New York, N.Y.), 2000. 290: pp. 21262129.Google Scholar
8. Kim, S.H., et al. , Highly Oriented and Ordered Arrays from Block Copolymers via Solvent Evaporation . Advanced Materials, 2004. 16: pp. 226231.Google Scholar
9. Park, C., et al. , Double textured cylindrical block copolymer domains via directional solidification on a topographically patterned substrate . Applied Physics Letters, 2001. 79: pp. 848850.Google Scholar