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Joining of Metal Films to Carbon-Carbon Composite Material by Metal Plasma Immersion Ion Implantation

Published online by Cambridge University Press:  15 February 2011

André Anders ,
Simone Anders ,
Ian G. Brown  and
Peter Chow
André Anders
Affiliation:
Lawrence Berkeley Laboratory, University of California, Berkeley, CA 94720 On leave from Max-Planck-Institut für Plasmaphysik, Bereich Berlin, Mohrenstr. 40/41, 10117 Berlin, Germany
Simone Anders
Affiliation:
Lawrence Berkeley Laboratory, University of California, Berkeley, CA 94720 On leave from Max-Planck-Institut für Plasmaphysik, Bereich Berlin, Mohrenstr. 40/41, 10117 Berlin, Germany
Ian G. Brown
Affiliation:
Lawrence Berkeley Laboratory, University of California, Berkeley, CA 94720
Peter Chow
Affiliation:
Superior Vacuum Technology, Eden Prairie, MN 55344.
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Abstract

Adhesion of metal films to carbon-carbon composite materials is a problem when using conventional techniques such as sputter deposition. Metal plasma immersion ion implantation is a novel technique which in combination with metal plasma deposition can produce metal-tocomposite bonding with very good adhesion characteristics. The substrate is immersed in a metal plasma which is produced by a pulsed vacuum arc. When the substrate is biased to high negative voltage the metal ions are accelerated toward and implanted into the substrate. A repetitively pulsed bias (Its pulses) is used to avoid arcing and other deleterious effects. Between high voltage pulses, metal plasma is deposited onto the surface with an energy typical of vacuum arcs, about 50–100 eV. The underlying idea of this mixed implantation-deposition technique is the formation of an extended substrate-film intermixed layer. We have demonstrated the technique for nickel films on carbon-carbon composite materials.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 314: Symposium R – Joining and Adhesion of Advanced Inorganic Materials , 1993 , 205
Copyright
Copyright © Materials Research Society 1993

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References

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