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Ion Mixing of Near-Noble Transition Metal Films on Evaporated and Large-Grained Aluminum Substrates

Published online by Cambridge University Press:  25 February 2011

E. Ma
Affiliation:
California Institute of Technology, Pasadena, CA 91125
X.-A. Zhao
Affiliation:
California Institute of Technology, Pasadena, CA 91125
M-A. Nicolet
Affiliation:
California Institute of Technology, Pasadena, CA 91125
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Abstract

Ion mixing experiments using Xe ions at temperatures ranging from 77K to about 450K were conducted on Al/Ni and Al/Pt couples. Evaporated polycrystalline Al films and large-grained Al crystals were used as substrates. Xenon irradiation of Al/Pt bilayers achieves considerable intermixing and a temperature dependence is observed. Only moderate interfacial mixing with little temperature dependence is observed in Al/Ni bilayers. The mixing efficiency of Al/Ni is consistent with the phenomenological model of thermal spike mixing, and so is the absence of a pronounced temperature dependence below 450K. No significant difference is noted in ion mixing of evaporated and large-grained Al substrates. In contrast to ion mixing, Al/Pt and Al/Ni samples behave similarly upon thermal annealing and form well-defined compounds. The results are also compared with Si/metal systems, where silicides can be formed readily by low temperature thermal annealing as well as by ion mixing of bilayer samples.

Type
Research Article
Copyright
Copyright © Materials Research Society 1987

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References

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