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Investigations on electrical conduction properties and crystallization conditions of V2O5-P2O5 glass based semiconductors

Published online by Cambridge University Press:  18 February 2013

Akifumi Matsuda
Affiliation:
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259-J3-16 Nagatsuta, Midori, Yokohama 226-8502, Japan.
Takuya Aoyagi
Affiliation:
Hitachi Research Laboratory, Hitachi Ltd., 7-1-1 Omika, Hitachi 319-1292, Japan.
Takashi Naito
Affiliation:
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259-J3-16 Nagatsuta, Midori, Yokohama 226-8502, Japan. Hitachi Research Laboratory, Hitachi Ltd., 7-1-1 Omika, Hitachi 319-1292, Japan.
Tadashi Fujieda
Affiliation:
Hitachi Research Laboratory, Hitachi Ltd., 7-1-1 Omika, Hitachi 319-1292, Japan.
Kenjiro Ikejiri
Affiliation:
Namiki Precision Jewel Co., Ltd., 3-8-22 Shinden, Adachi, Tokyo 123-8511, Japan.
Koji Koyama
Affiliation:
Namiki Precision Jewel Co., Ltd., 3-8-22 Shinden, Adachi, Tokyo 123-8511, Japan.
Ryosuke Yamauchi
Affiliation:
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259-J3-16 Nagatsuta, Midori, Yokohama 226-8502, Japan.
Geng Tan
Affiliation:
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259-J3-16 Nagatsuta, Midori, Yokohama 226-8502, Japan.
Satoru Kaneko
Affiliation:
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259-J3-16 Nagatsuta, Midori, Yokohama 226-8502, Japan. Kanagawa Industrial Technology Center, 705-1 Shimoimaizumi, Ebina 243-0435, Japan.
Mamoru Yoshimoto
Affiliation:
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259-J3-16 Nagatsuta, Midori, Yokohama 226-8502, Japan.
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Abstract

We studied the electrical properties of thermally treated V2O5-CuO-Fe2O3-P2O5 (vanadate) glasses under reducing high-vacuum conditions. The glasses were prepared by using a melt-quenching method and then applied on Al2O3 substrates as ∼40μm-thick films. The glass films were then heat treated at 375−550°C under a vacuum of 10−6 Pa. Powder X-ray diffraction showed the formation of complex oxides of both MxV2O5 (M = Cu, Fe; x = 0.12−1.3) and vanadium oxides (VOx; x = 1.5−2.5). The resistivity of the glass film crystallized at 550°C measured at 50°C and 300°C were 1.8 × 100 Ωcm and 2.8 × 10−1 Ωcm, respectively, which was 10 times lower than that of the film crystallized in air. The Seebeck coefficient was −132 μV/K at 50°C and −130 μV/K at 300°C. These results show that the vanadate glasses crystallized under the appropriate condition become potential candidate materials for semiconductor and thermoelectric application.

Type
Articles
Copyright
Copyright © Materials Research Society 2013 

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References

REFERENCES

DiSalvo, Francis J., Science 285, 703 (1999).CrossRefGoogle Scholar
Tritt, Terry M. and Subramanian, M. A., MRS Bulletin 31, 188 (2006).CrossRefGoogle Scholar
Koumoto, Kunihito, Terasaki, Ichiro and Funahashi, Ryoji, MRS Bulletin 31, 206 (2006).CrossRefGoogle Scholar
Dubey, Nidhi and Leclerc, Mario, J. Polym. Phys. B: Polym. Phys. 49, 467 (2011).CrossRefGoogle Scholar
Toshima, Naoki, Jiravanichanun, Nattha and Marutani, Hiromasa, J. Electron. Mater. 41, 1735 (2012).CrossRefGoogle Scholar
Denton, E. P., Rawson, H. and Stanworth, J. E., Nature 173, 1030 (1954).CrossRefGoogle Scholar
Linsley, G. S., Owen, A.E. and Hayatee, F. M., J. Non-Crystalline Solids. 4, 208 (1970).CrossRefGoogle Scholar
Naito, T., Aoyagi, T., Sawai, Y., Tachizono, S., Yoshimura, K., Hashiba, Y. and Yoshimoto, M., Jpn. J. Appl. Phys. 50, 088002 (2011).CrossRefGoogle Scholar
Armstrong, A. R., Lyness, C., Panchmatia, P. M. and Islam, M. S., Nature Mater. 10, 223 (2011).CrossRefGoogle Scholar
Fujieda, T., Aoyagi, T. and Naito, T., AIP Adv. 2, 022164 (2012).CrossRefGoogle Scholar
Aoyagi, T., Fujieda, T., Sawai, Y., Miyata, M., Naito, T. and Yamamoto, H., Mater. Res. Soc. Symp. Proc. 1454, 15 (2012).CrossRefGoogle Scholar
Toda, T., Kosuge, K. and Kachi, Y., Nippon Kagakushi 87, 1311 (1966).CrossRefGoogle Scholar