Hostname: page-component-78c5997874-xbtfd Total loading time: 0 Render date: 2024-11-03T04:07:43.850Z Has data issue: false hasContentIssue false
  • English
  • Français

Investigation of Interfaces in Ceramics by Electron Spectroscopic Imaging

Published online by Cambridge University Press:  15 February 2011

J. Mayer ,
J. Plitzko ,
F. Steinbach  and
H. Kohl
J. Mayer
Affiliation:
Max-Planck-Institut für Metallforschung, Institut für Werkstoffwissenschaft, Seestr. 92, D-70174 Stuttgart, Germany
J. Plitzko
Affiliation:
Max-Planck-Institut für Metallforschung, Institut für Werkstoffwissenschaft, Seestr. 92, D-70174 Stuttgart, Germany
F. Steinbach
Affiliation:
Max-Planck-Institut für Metallforschung, Institut für Werkstoffwissenschaft, Seestr. 92, D-70174 Stuttgart, Germany
H. Kohl
Affiliation:
Physikalisches Institut, Universität Münster, Wilhelm-Klemm-Str. 10, D-48149 Miinster, Germany
Get access

Abstract

Electron Spectroscopic Imaging (ESI) in an energy filtering TEM is a new analytical technique which allows one to obtain two-dimensional elemental distribution images. In the present paper the detection limits of the new technique will be discussed. Si3N4 ceramics with different thicknesses of the amorphous oxide grain boundary layers have been chosen as a model system. Quantitative results have been obtained on three different energy filtering instruments and will be compared with the results of theoretical calculations. The application of ESI for the mapping of near edge fine structure will be discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 357: Symposium C – Structure and Properties of Interfaces in Ceramics , 1994 , 237
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Lanio, S., Rose, H., and Krahl, D., Optik 73, 56 (1986).Google Scholar
2. Krivanek, O.L., Gubbens, A.J., Dellby, N., and Meyer, C.E., MMM 3, 187 (1992).Google Scholar
3. Strecker, A., Salzberger, U., and Mayer, J., Pract. Metallography 30, 482 (1993).Google Scholar
4. Jeanguillaume, C., Trebbia, P., and Colliex, C., Ultramicroscopy 3, 237 (1978).Google Scholar
5. Egerton, R.F., Electron Energy Loss Spectroscopy in the Electron Microscope, Plenum Press, New York (1986).Google Scholar
6. Weickenmeier, A., Nüchter, W., and Mayer, J., Optik, to be published.Google Scholar
7. Berger, A., and Kohl, H., Optik 92, 175 (1993).Google Scholar
8. Clarke, D.R., J. Am. Cer. Soc. 70, 15 (1987).Google Scholar
9. Kleebe, H.J., Cinibulk, M.K., Cannon, R.M., and Rühle, M., J. Am. Cer. Soc. 76, 1969 (1993).Google Scholar
10. Cinibulk, M.K., Kleebe, H.J., and Rühle, M., J. Am. Cer. Soc. 76, 426 (1993).Google Scholar
11. Tanaka, I., Kleebe, H.J., Cinibulk, M.K., Bruley, J., Clarke, D.R., and Rühle, M., J. Am. Cer. Soc., in press (1994).Google Scholar
12. Berger, A., Mayer, J., and Kohl, H., Ultramicroscopy 55, 101 (1994).Google Scholar
13. Rösler, M., Zachai, R., Füβer, H.-J., Jiang, X., Klages, C.-P., Proc. 2nd Int. Conf. Applications Diamond Films and Related Mat., Yoshikawa, M., Murakawa, M., Eds., Tokyo, (1993).Google Scholar