Article contents
Internal Stresses and Damping in Ni/Cu Multilayered Thin Films
Published online by Cambridge University Press: 25 February 2011
Abstract
The internal stresses and anelastic properties of an electrodeposited Ni/Cu multilayered membrane as measured dynamically using a vibrating membrane method are reported. Our results indicate that the as-deposited membrane has a high internal stress approaching the yield strength. Due to the accuracy of the experimental method, the damping of the multilayered membrane can be measured in the presence of the high internal stresses. It is shown that the relatively large damping capacity exhibited by the multilayered film is different from classical damping associated with the modulus defect, and may be related to an interfacial relaxation effect such as sliding.
- Type
- Research Article
- Information
- Copyright
- Copyright © Materials Research Society 1993
References
REFERENCES
- 4
- Cited by