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Integrating Organic Molecules to Silicon Surfaces

Published online by Cambridge University Press:  10 February 2011

X.-Y. Zhu ,
J. A. Mulder ,
R. P. Hsung ,
W. F. Bergerson ,
A. Gasser  and
A. Nguyen
X.-Y. Zhu
Affiliation:
Department of Chemistry, University of Minnesota, Minneapolis, MN 55455, [email protected]
J. A. Mulder
Affiliation:
Department of Chemistry, University of Minnesota, Minneapolis, MN 55455, [email protected]
R. P. Hsung
Affiliation:
Department of Chemistry, University of Minnesota, Minneapolis, MN 55455, [email protected]
W. F. Bergerson
Affiliation:
Department of Chemistry, University of Minnesota, Minneapolis, MN 55455, [email protected]
A. Gasser
Affiliation:
Department of Chemistry, University of Minnesota, Minneapolis, MN 55455, [email protected]
A. Nguyen
Affiliation:
Department of Chemistry, University of Minnesota, Minneapolis, MN 55455, [email protected]
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Abstract

We present a general strategy for the efficient assembly of organic molecules directly onto the silicon surface via Si-N and Si-O linkages. This is achieved from the reaction between an amine or an alcohol functional group and a chlorinated Si surface. The resulting organic monolayers are thermally stable. These methods are applicable for the assembly of a variety of functional organic molecules in both vacuum environment and solution phases.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 576: Symposium DD – Organic/Inorganic Hybrid Materials II , 1999 , 177
Copyright
Copyright © Materials Research Society 1999

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References

REFERENCES

1. Linford, M. R., Fenter, P., Eisenberger, P. M., and Chidsey, C. E. D., J. Am. Chem. Soc. 117, 3145 (1995).10.1021/ja00116a019Google Scholar
2. Sieval, A. B., Demiral, A. L., Nissink, J. W. M., Linford, M. R., Maas, J. H. Van der, Jeu, W. H. De, Zuilhof, H., and Sudholter, E. J., Langmuir 14, 1759 (1998).10.1021/la971139zGoogle Scholar
3. Bansal, A., Li, X., Lauermann, I., Lewis, N. S., Yi, S. I., and Weinberg, W. H., J. Am. Chem. Soc. 118, 7725 (1996).10.1021/ja960348nGoogle Scholar
4. Hamers, R. J., Hovis, J. S., Lee, S., Liu, H.-B., Shan, J., J. Phys. Chem.B 101, 1489 (1997).10.1021/jp9626778Google Scholar
5. Konecny, R. and Doren, D. J., J. Am. Chem. Soc. 119, 11098 (1997).10.1021/ja972247aGoogle Scholar
6. Teplyakov, A. V., Kong, M. J., and Bent, S. F., J. Am. Chem. Soc. 119, 11100 (1997).10.1021/ja972246iGoogle Scholar
7. Effenberger, F., Gotz, G., Bidlingmaier, B., and Wezstein, M., Angew. Chem. Int. Ed. 37, 2462 (1998).10.1002/(SICI)1521-3773(19981002)37:18<2462::AID-ANIE2462>3.0.CO;2-R3.0.CO;2-R>Google Scholar
8. Cleland, G., Horrocks, B. R., and Houlton, A., J. Chem. Soc. Faraday Trans. 91, 4001 (1995).10.1039/ft9959104001Google Scholar
9. Sailor, M. J. and Lee, E. J., Advanced Materials, 9, 783 (1997).10.1002/adma.19970091004Google Scholar
10. Buriak, J. M. and Allen, M. J., J. Am. Chem. Soc. 120, 1339 (1998).10.1021/ja9740125Google Scholar
11. Song, J. H. and Sailor, M. J., J. Am. Chem. Soc. 120, 2376 (1998).10.1021/ja9734511Google Scholar
12. Kim, N. Y. and Laibinis, P. E., J. Am. Chem. Soc. 120, 4516 (1998).10.1021/ja9712231Google Scholar
13. Waltenburg, H. N. and Yates, J. T., Jr, Chem. Rev 95, 1589 (1995).10.1021/cr00037a600Google Scholar
14. George, S. M., Ott, A. W., and Klaus, J. W., J. Phys. Chem. 100, 13121 (1996).10.1021/jp9536763Google Scholar
15. Nishino, H., Yang, W., Dohnalek, Z., Ukraintsev, V., Yates, J. T. Jr, J. Vac. Sci. Technol. A15, 182 (1997).10.1116/1.580461Google Scholar
16. Moulder, J. F., Stickle, W. F., Sobol, P. E., and Bomben, K. D., Handbook of X-day Photoelectron Spectroscopy, editted by Chastain, J. and King, R. C. Jr, (Physical Electronics, Inc., Eden Prairie, 1995).Google Scholar
17. Bergerson, W. F., Mulder, J. A., Hsung, R. P., and Zhu, X.-Y., J. Am. Chem. Soc. 121,454 (1999).10.1021/ja9832966Google Scholar
18. Kuger, Th., Thibaut, U., Abraham, M., Folkers, G., and Gopel, W., Surf Sci. 260, 64 (1992).10.1016/0039-6028(92)90019-3Google Scholar
19. Ranke, W. and Jacobi, K., Surf Sci. 63, 33 (1977).10.1016/0039-6028(77)90324-7Google Scholar
20. Somorjai, G. A., Introduction to Surface Chemistry and Catalysis (John Wiley & Sons, New York, 1994) pp 383.Google Scholar
21. Canham, L. T., Appl. Phys. Lett. 57, 1046 (1990).10.1063/1.103561Google Scholar
22. Poirier, G. E., Chem. Rev. 97, 1117 (1997).10.1021/cr960074mGoogle Scholar
23. Mulder, J. A., Hsung, R. P., and Zhu, X.-Y., to be published.Google Scholar