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In-Situ Transmission Electron Microscopy for Analysis of Ion-Beam-Growth Processes
Published online by Cambridge University Press: 21 February 2011
Abstract
Two types of systems for in situ transmission electron microscopy analysis of ion-beam etching, ion-beam sputtering and ion-beam assisted deposition are reported. their design, operational features and some applications are presented. Radiation-stimulated diffusion in Mo-Si heterostructure, early growth of ion-beam sputtered in-Sn, in-Sn-O, ZnS:Mn films and recrystallization of ln-Sn-O films during vacuum post-annealing are studied.
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- Copyright © Materials Research Society 1995
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