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InGaAs/InGaAsP Quantum-Well Engineering for Multiple Regrowth MOVPE Process

Published online by Cambridge University Press:  01 February 2011

Hans-Jeorg Lohe
Affiliation:
[email protected], ETH Zurich, Electronics laboratory, Gloriastr. 35, ETZ H70, Zurich, ZH, CH-8092, Switzerland, 0041 44 6320693, 0041 44 6321210
Emilio Gini
Affiliation:
[email protected], ETH Zurich, FIRST, Switzerland
Riccardo Scollo
Affiliation:
[email protected], ETH Zurich, Electronics laboratory, Switzerland
Franck Robin
Affiliation:
[email protected], ETH Zurich, Electronics laboratory, Switzerland
Heinz Jaeckel
Affiliation:
[email protected], ETH Zurich, Electronics laboratory, Switzerland
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Abstract

For the heterogeneous integration of several layer structures for absorber, gain and passive waveguide sections in a monolithically-integrated mode locked laser diode, the bandgap of the absorber section has to be matched to the emission wavelength of the gain section. Because of the use of a multiple regrowth process for optical butt-coupling, the first grown multiple quantum-well gain material undergoes a quantum-well intermixing process, resulting in a blue shift of the emitting optical wavelength. Experimental results show, that the blue shift is dependent on the process details and cannot be investigated by simple thermal cycling of unprocessed quantum well-structures. With the introduction of an effective quantum-well width computed from the emission wavelength we found a linear relationship between the effective quantum well width shrinkage and the cumulated regrowth heating time of 8.3Å/h at a growth temperature of 630°C. Therefore knowing the cumulated regrowth time for a laser fabrication, we could successfully design the initial quantum well thickness that yields the targeted emitting wavelength and excellent matching to the absorber bandedge.

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

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References

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