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The influence of the internal microstructure on the surface parameters of polycrystalline thin films

Published online by Cambridge University Press:  21 March 2011

C. Eisenmenger-Sittner  and
A. Bergauer
C. Eisenmenger-Sittner
Affiliation:
Institut für Angewandte und Technische Physik, Technische Universität Wien, Wiedner Hauptstraße 8-10 A-1040 Vienna, Austria
A. Bergauer
Affiliation:
Institut für Angewandte und Technische Physik, Technische Universität Wien, Wiedner Hauptstraße 8-10 A-1040 Vienna, Austria
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Abstract

Physical Vapor Deposition (PVD) processes commonly lead to the formation of polycrystalline thin films due to the effects of island nucleation and growth. Scanning probe Methods such as Atomic Force Microscopy (AFM) or Scanning Tunneling Microscopy (STM) are widely used for the characterization of the film surface. The topographic data obtained from these measurements can be converted to roughness values, Power Spectral Densities (PSD's) or correlation functions.

It is the objective of this paper to evaluate the possibilities to characterize the polycrystalline template which generates the film surface solely by quantities derived from topographic data. For this purpose roughness values, PSD's and correlation functions of polycrystalline Al-Films deposited on glass substrates and from simulated surfaces are compared. The main factors which influence the shape of PSD's and correlation functions are determined and possible connections between the constitution of the polycrystalline template (e. g. shape and size-distribution of the crystalline domains) and the film roughness are discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 672: Symposium O – Mechanisms of Surface and Microstructure Evolution in Deposited Films and Film Structures , 2001 , O33.1
Copyright
Copyright © Materials Research Society 2001

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References

REFERENCES

1. Barabási, A.-L., Stanley, H. E., Fractal concepts in surface growth, (Cambridge University Press, 1995).Google Scholar
2. Kardar, M., Parisi, G., Zhang, Y.-C., Phys. Rev. Lett. 56(9) 889 (1986),Google Scholar
3. Venables, J. A., Spiller, G. D. T., Hanbücken, M., Rep. Prog. Phys. 47 399 (1984).Google Scholar
4. Bartelt, M. C., Evans, J. V., Phys. Rev. B 46 12675 (1992).Google Scholar
5. Wolf, D. E., Villain, J., Europhys. Lett. 13(5) 389(1990).Google Scholar
6. Srolovitz, D. J., J. Vac. Sci. Technol. A4(6) 2925 (1986).Google Scholar
7. Oglivy, J. A., Theory of Wave Scattering From Random Rough Surfaces, (IOP Publishing, Philadelphia, 1991).Google Scholar
8. Trofimov, V. I., Mat. Res. Soc. Proc. 440 401 (1997).Google Scholar
9. Vicsek, T., Fractal growth phenomena (World Scientific, Singapore 1989).Google Scholar
10. Sahni, P. S., Srolovitz, D. J., Grest, G. S., Anderson, M. P., Safran, S. A., Phys. Rev. B 28(5) 2705 (1983).Google Scholar
11. Eisenmenger-Sittner, C., J. Appl. Phys. 89(11) (2001), in print.Google Scholar
12. Mullins, W. W., J. Appl. Phys. 28(3) 333 (1957).Google Scholar
13. Mullins, W. W., J. Appl. Phys. 30(1) 77 (1959).Google Scholar