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Influence of Energy Deposited by Energetic Particle Bombardment on thin Film Characteristics

Published online by Cambridge University Press:  25 February 2011

Harold F. Winters ,
W. Eckstein  and
H.J. Coufal
Harold F. Winters
Affiliation:
IBM Research Division, Almaden Research Center, 650 Harry Road, San Jose, California 95120-6099
W. Eckstein
Affiliation:
Max-Planck-Institut fur Plasmaphysik, D-8046 Garching, Munich, Germany
H.J. Coufal
Affiliation:
IBM Research Division, Almaden Research Center, 650 Harry Road, San Jose, California 95120-6099
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Abstract

It has been recognized since the 1960's that bombardment of a growing thin film by energetic particles strongly influences film properties. Particle bombardment has generally been accomplished by accelerating ions into the growing film. However, it has also been recognized since the 1960's that energetic particles reflected from the target influence the characteristics of films grown by physical sputtering and many experiments have been interpreted on this basis. A systematic study of the energy reflected from the surface by normally incident, singly charged noble-gas ions on five substrates of different masses has recently been published. This data along with sputter yields from the literature allow estimates to be made which were previously unavailable. The energy reflected from the target is carried away by electrons, sputtered particles and reflected ions (neutrals). The purpose of this paper is to provide basic information which will allow thin film scientists to estimate the influence of various experimental parameters on the amount of energy arriving at the growing film. The energy reflected from the target per sputtered atom will be given as a function of ion mass, target mass, and ion energy. TRIM.SP Monte Carlo calculations will be used to estimate the ratio of the energy carried away by sputtered atoms to that carried away by reflected ions. Calculations will also be used to estimate the average energy of the sputtered atoms as a function of ion mass, substrate mass and ion energy. It will be shown how this information can be used to guide the adjustment of experimental parameters in sputtering environments so as to control film characteristics.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 236: Symposium B – Photons and Low Energy Particles in Surface Processing , 1991 , 273
Copyright
Copyright © Materials Research Society 1992

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