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In Situ Observations of Beam-Induced Effects During High-Resolution Electron Microscopy

Published online by Cambridge University Press:  26 February 2011

David J. Smith ,
Ping Lu ,
M. R. McCartney  and
R. Sharma
David J. Smith
Affiliation:
Center for Solid State Science, Arizona State University, Tempe, AZ 85287
Ping Lu
Affiliation:
Department of Mechanics and Materials Science, Rutgers University, Piscataway, New Jersey, 08855
M. R. McCartney
Affiliation:
Center for Solid State Science, Arizona State University, Tempe, AZ 85287
R. Sharma
Affiliation:
Center for Solid State Science, Arizona State University, Tempe, AZ 85287
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Abstract

A variety of electron-beam-induced effects, including oxidation, reduction and surface rearrangements are observed to occur at surfaces of oxides, fluorides and compound semiconductors during electron irradiation within the electron microscope. The extent and type of surface modifications observed are shown to depend upon the irradiation level, the residual microscope vacuum and the specimen temperature. For example, ex situ annealing of compound semiconductors leads to different end-products compared with in situ irradiation, thus showing that residual gas components can have a strong influence on the surface reactions. Electron irradiation of rutile during annealing at high temperature under ultrahigh vacuum conditions caused the rapid development of well-facetted holes without the usual intermediary phase seen at room temperature in conventional vacuum.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 201: Symposium A – Surface Chemistry and Beam-Solid Interactions , 1990 , 599
Copyright
Copyright © Materials Research Society 1991

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