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High-throughput characterization of shape memory thin films using automated temperature-dependent resistance measurements

Published online by Cambridge University Press:  26 February 2011

Sigurd Thienhaus ,
Christiane Zamponi ,
Holger Rumpf ,
Jae Hattrick-Simpers ,
Ichiro Takeuchi  and
Alfred Ludwig
Sigurd Thienhaus
Affiliation:
[email protected], caesar, Combinatorial Materials Science, Germany
Christiane Zamponi
Affiliation:
[email protected], caesar, Smart Materials, Germany
Holger Rumpf
Affiliation:
[email protected], caesar, Smart Materials, Germany
Jae Hattrick-Simpers
Affiliation:
[email protected], University of Maryland, Materials Science and Engineering, United States
Ichiro Takeuchi
Affiliation:
[email protected], University of Maryland, Materials Science and Engineering, United States
Alfred Ludwig
Affiliation:
[email protected], caesar, Combinatorial Materials Science, Germany
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Abstract

Shape memory alloy (SMA) thin films are used as actuator materials in MEMS due to their unique properties. Binary thin films with a composition close to Ni50Ti50 are well-established materials, whereas ternaries like NiTiCu, NiTiPd, NiTiHf are less studied. Furthermore, new alloys are being developed which show a magnetic shape memory effect, e.g. Ni2MnGa. For the optimization of known, and the development of new, SMA thin films, a fast and reliable characterization technology is needed, which rapidly identifies the transformation temperatures (i.e. martensite and austenite start and finish temperatures) for a range of material compositions deposited on a whole wafer. In this paper, automated temperature-dependent resistance measurements are discussed as a means which yields the thermal hysteresis of the investigated thin films. Results of monitoring the uniformity of shape memory film depositions on the wafer level, as well as results on the use of this method as a tool for screening for new SMA films by characterization of materials libraries are reported.

Keywords

combinatorial synthesisfilmsputtering
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 894: Symposium LL – Combinatorial Methods and Informatics in Materials Science , 2005 , 0894-LL06-06
Copyright
Copyright © Materials Research Society 2006

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References

REFERENCES

1. Miyazaki, S. and Ishida, A., Mat. Sci. Eng. A273–275, 106–133 (1999).Google Scholar
2. Gupta, V., Martynov, V. and Johnson, A. D., Actuator 2002, 355–358 (2002).Google Scholar
3. Winzek, B., Schmitz, S., Rumpf, H., Sterzl, T., Hassdorf, R., Thienhaus, S., Feydt, J., Moske, M., and Quandt, E., Mat. Sci. Eng. A378, 40–46 (2004).Google Scholar
4. Liu, Y., Kohl, M., Okutsu, K. and Miyazaki, S., Mat. Sci. Eng. A378, 205–209 (2004).Google Scholar
5. Murray, S. J. et al. , J. Appl. Phys. 83, 7297–7299 (1998).Google Scholar
6. James, R. D. and Wuttig, M., Philosophical Magazine A77, 1273–1299 (1998).Google Scholar
7. Winzek, B., Sterzl, T., Rumpf, H. and Quandt, E., J. Phys. IV 112, 1163–1168 (2003).Google Scholar
8. Rumpf, H., Winzek, B., Zamponi, C., Siegert, W., Neuking, K. and Quandt, E., Mat. Sci. Eng. A378, 429–433 (2004).Google Scholar
9. Takeuchi, I. et al. , Nature Materials 2 (3), 180–184 (2003).Google Scholar
10. Pollock, D. D., Electrical Conduction in Solids, American Society for Metals, 148–161 (1985).Google Scholar
11. Bozorth, R. M., Ferromagnetism, D. Van Nostrand Company, Inc. (1951).Google Scholar
12. Uchil, J., Mahesh, K. K. and Kumara, K. G., Physica B 324, 419–428 (2002).Google Scholar
13. Johnson, A. D., Micromech, J.. Microeng. 1, 34 (1991).Google Scholar
14. Chang, L. and Grummon, D. S., Philosophical Magazine A76, 191–219 (1997).Google Scholar
15. Wan, D. and Komvopoulos, K., J. Mater. Res. 20 (6), 1606–1612 (2005).Google Scholar
16. Tang, W., Metallurgical and Materials Transactions 28A, 537–544 (1997).Google Scholar
17. Takeuchi, I. and Xiang, X. D., Combinatorial Materials Synthesis, Dekker Media (2003).Google Scholar