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Highly Supersaturated, Highly Strained Sputtered Ag-Co and Ag-Ni Layers

Published online by Cambridge University Press:  10 February 2011

L. Velterop ,
A. Buis ,
R. Delhez ,
Th.H. de Keijser ,
E.J. Mittemeijer  and
D. Reefman
L. Velterop
Affiliation:
Laboratory of Materials Science, Delft University of Technology, Rotterdamseweg 137, 2628 AL Delft, The Netherlands
A. Buis
Affiliation:
Laboratory of Materials Science, Delft University of Technology, Rotterdamseweg 137, 2628 AL Delft, The Netherlands
R. Delhez
Affiliation:
Laboratory of Materials Science, Delft University of Technology, Rotterdamseweg 137, 2628 AL Delft, The Netherlands
Th.H. de Keijser
Affiliation:
Laboratory of Materials Science, Delft University of Technology, Rotterdamseweg 137, 2628 AL Delft, The Netherlands
E.J. Mittemeijer
Affiliation:
Laboratory of Materials Science, Delft University of Technology, Rotterdamseweg 137, 2628 AL Delft, The Netherlands
D. Reefman
Affiliation:
Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands
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Abstract

Thin Ag-Ni and Ag-Co layers with compositions of 0, 15, 22 to 28 at% Ni or Co were made by magnetron sputtering. TEM experiments revealed that the layers exhibited a {111} fiber texture with a high density of twins, always with the twinning plane parallel to the layer surface. X-ray diffraction and TEM results indicate that all Ni or Co is dissolved in the Ag, although some compositional inhomogeneity occurs: the layers are highly supersaturated with Ni or Co. Unlike the pure Ag layer, the Ag-Ni and Ag-Co layers exhibited high strains in the as prepared state.

Upon annealing Ni or Co precipitated. The Ni precipitates were small, spherical particles oriented parallel to the surrounding Ag. The strains in the Ag-Ni and Ag-Co layers after annealing were less than the calculated thermal strains, but they were larger than the strain in the pure Ag layer after an equal annealing treatment.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 472: Symposium I – Polycrystalline Thin Films - Structure, Texture, Properties..III , 1997 , 63
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

1. Parker, M.A., Coffey, K.R., Hylton, T.L. & Howard, J.K. in Magnetic Utrathin Films. Multilayers and Surface/Magnetic interfaces - Physics and Characterization, edited by Chappert, C. et al. (Mat. Res. Soc. Proc. 313, Pittsburgh, PA, 1993), p. 85–90 Google Scholar
2. Jiang, J.S., Xiao, J.Q. & Chien, C.L., Appl. Phys. Lett. 61 (19), (1992), p. 2362–2364 Google Scholar
3. Bain, X., Zaluska, A., Altounian, Z., Stròm-Olsen, J.O., Huai, Y. & Cochrane, R.W. in Magnetic Utrathin Films. Multilayers and Surface/Magnetic interfaces - Physics and Characterization. edited by Chappert, C. et al. (Mat. Res. Soc. Proc. 313, Pittsburgh, PA, 1993), p. 405–410 Google Scholar
4. Li, D.Y. & Chen, L.Q., Acta Mater. 45 No 2, (1997), p. 471–479 Google Scholar
5. Karakaya, I. & Thompson (Ag-Co), W.T. and Singleton, M. & Nash, P. (Ag-Ni) in Binary Alloy Phase Diagrams. 2nd edition by Massalski, T.B., Okamoto, H., Subramanian, P.R. & Kacprzak, L., ASM International, (1990), p. 25, 26, 64–66Google Scholar
6. Hauk, V.M. & Macherauch, E., Adv. X-ray Anal. 27, (1983), p. 81–99 Google Scholar
7. Segmüller, A. & Murakami, M. in Analytical Techniques for Thin Films, edited by Tu, K.N. & Rosenberg, R. (Treatise on Mat. Sci. and Techn. 27, Academic Press, Boston, 1988), p. 143–200 Google Scholar
8. Warren, , X-ray diffraction. Eddison-Weshley Publishing Company, Massachusetts, (1969), p. 275–298 Google Scholar
9. Hendriks, M., X-ray Diffraction Study of Polycrystalline Silicon Layers. Ph.D. thesis, Delft University of Technology, (1985), p. 49–56 Google Scholar
10. Velterop, L., Buis, A., Delhez, R., de Keijser, Th.H., Mittemeijer, E.J. & Reefman, D. to be publishedGoogle Scholar
11. Machlin, E.S., Materials Science in Microelectronics. The relationship between thin film processing and structure. Giro Press, Croton-on-Hudson, N.Y., (1995), p. 73–81, 98Google Scholar
12. Lide, D.R., Handbook of Chemistry and Physics. 73rd edition, CRC Press, Boca Raton, (1992), tables 12–78/130/131Google Scholar
13. Lodder, J.C., de Haan, P. & van Kranenburg, H., J. Magn. Magn. Mater. 128, (1993), p. 219 Google Scholar